SCHEMBL3202573

SCHEMBL3202573

O=[N+]([O-])c1ccccc1CCc1ccccc1[N+](=O)[O-]

nearest known ligand 0.72

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.72
TSHR P16473 1/20 0.72
HPGD P15428 1/20 0.64
HSD17B10 Q99714 1/20 0.54
HTT P42858 1/20 0.53
TDP1 Q9NUW8 3/20 0.52
NPC1 O15118 1/20 0.52
RECQL P46063 1/20 0.52
RAB9A P51151 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.51
SIGMAR1 Q99720 1/20 0.51
ACHE P22303 1/20 0.50
MEN1 O00255 1/20 0.50
KMT2A Q03164 1/20 0.50
GPR35 Q9HC97 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7191430 0.89 ALDH1A1 (0.64) ALDH1A1TSHRHPGDHTTTDP1
SCHEMBL249845 0.89 ALDH1A1 (0.64) ALDH1A1TSHRHPGDHSD17B10HTT
SCHEMBL301933 0.88 ALDH1A1 (0.69) ALDH1A1TSHRHPGDHSD17B10HTT
SCHEMBL28181536 0.88 ALDH1A1 (0.58) ALDH1A1TSHRHPGDHTTNPC1
SCHEMBL1814444 0.87 ALDH1A1 (0.62) ALDH1A1TSHRHPGDHSD17B10HTT
SCHEMBL5186181 0.87 ALDH1A1 (0.74) ALDH1A1TSHRHPGDHSD17B10HTT
SCHEMBL249846 0.87 ALDH1A1 (0.68) ALDH1A1TSHRHPGDHSD17B10HTT
SCHEMBL30178336 0.87 ALDH1A1 (0.62) ALDH1A1TSHRHPGDHSD17B10HTT
SCHEMBL2880002 0.87 ALDH1A1 (0.62) ALDH1A1TSHRHPGDHSD17B10HTT
SCHEMBL13477030 0.87 ALDH1A1 (0.62) ALDH1A1TSHRHPGDHSD17B10HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119191987-A Preparation process of 2, 2-dinitrobibenzyl 浙江华洲药业有限公司 2024-12-27 CN claimed
CN-118908838-A Method for synthesizing 2,2' -dinitrobibenzyl 广西金源生物化工实业有限公司 2024-11-08 CN claimed
CN-216092332-U Separation washing equipment for synthesizing 2, 2' -dinitrodibenzyl 安徽金鼎医药股份有限公司 2022-03-22 CN claimed
CN-215586417-U Reaction kettle for synthesizing 2, 2' -dinitrodibenzyl 安徽金鼎医药股份有限公司 2022-01-21 CN claimed
CN-113149989-A Method for preparing medicine and medicine intermediate by continuous solid-liquid-gas three-phase reaction 浙江瑞博制药有限公司 2021-07-23 CN claimed
CN-111253312-A Synthesis method of iminodibenzyl 浙江华洲药业有限公司 2020-06-09 CN claimed
CN-107298645-B Method for preparing 2, 2' -dinitrobibenzyl 甘肃皓天医药科技有限责任公司 2020-04-03 CN claimed
US-7539006-B2 Electrolytic solution for driving electrolytic capacitor and electrolytic capacitor RUBYCON CORPORATION (JP) 2009-05-26 US claimed
US-20070029529-A1 Electrolytic solution for driving electrolytic capacitor and electrolytic capacitor KOMATSU AKIHIKO 2007-02-08 US claimed
US-20040245105-A1 Electrolyte solution for driving electrolytic capacitor and electrolytic capacitor RUBYCON CORPORATION (JP) 2004-12-09 US claimed
EP-1437749-A1 ELECTROLYTE SOLUTION FOR DRIVING ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR Rubycon Corporation (JP) 2004-07-14 EP claimed
CN-119191987-A Preparation process of 2, 2-dinitrobibenzyl 浙江华洲药业有限公司 2024-12-27 CN disclosed
CN-118908838-A Method for synthesizing 2,2' -dinitrobibenzyl 广西金源生物化工实业有限公司 2024-11-08 CN disclosed
CN-118908838-A Method for synthesizing 2,2' -dinitrobibenzyl 广西金源生物化工实业有限公司 2024-11-08 CN disclosed
CN-118638054-A Comprehensive synthesis method of iminostilbene and intermediate thereof 湖北华洲药业有限公司 2024-09-13 CN disclosed
EP-0158115-A2 Process for the preparation of iminodibenzyl CL PHARMA AKTIENGESELLSCHAFT (AT) 1985-10-16 EP disclosed
US-4469769-A Photosensitive material for electrophotography contains halo-benzoquinone sensitizer MITA INDUSTRIAL CO. LTD. (JP) 1984-09-04 US disclosed
EP-0114482-A2 A photosensitive composition for electrophotography MITA INDUSTRIAL CO. LTD. (JP) 1984-08-01 EP disclosed
EP-0100581-A2 Photosensitive material for electrophotography MITA INDUSTRIAL CO. LTD. (JP) 1984-02-15 EP disclosed
US-4361638-A AMORPHOUS SILICON AND CARBON BASE MATERIAL DOPED WITH HYDROGEN AND FLUORINE FUJI PHOTO FILM CO., LTD. (JP) 1982-11-30 US disclosed