SCHEMBL28844852

SCHEMBL28844852

COc1cc(C(F)C(F)(F)C(F)(F)F)ccc1N

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.46
CYP3A4 P08684 3/20 0.46
TDP1 Q9NUW8 2/20 0.46
TSHR P16473 1/20 0.46
HSD17B10 Q99714 1/20 0.46
HTT P42858 1/20 0.39
APP P05067 4/20 0.38
ADRA2B P18089 1/20 0.36
PTGS1 P23219 1/20 0.36
POLB P06746 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
NFKB1 P19838 1/20 0.33
GAA P10253 1/20 0.33
BLM P54132 1/20 0.33
PMP22 Q01453 1/20 0.33
IDO1 P14902 1/20 0.33
MEN1 O00255 1/20 0.33
MAPT P10636 1/20 0.33
THRB P10828 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4424759 0.79 ALDH1A1 (0.36) ALDH1A1CYP3A4TDP1TSHRHTT
SCHEMBL6666750 0.78 CYP3A4 (0.41) ALDH1A1CYP3A4TDP1TSHRGAA
SCHEMBL1597428 0.75 ALDH1A1 (0.59) ALDH1A1CYP3A4TDP1TSHRHSD17B10
SCHEMBL28844795 0.75 CYP3A4 (0.44) ALDH1A1CYP3A4TSHRHSD17B10GAA
SCHEMBL28844875 0.75 SMN1; SMN2 (0.35) TSHRPOLBGAA
SCHEMBL3156196 0.75 TDP1 (0.41) ALDH1A1CYP3A4TDP1TSHRHTT
SCHEMBL3789315 0.75 ALOX15 (0.41) ALDH1A1CYP3A4TDP1TSHRHSD17B10
SCHEMBL18037696 0.75 TDP1 (0.41) ALDH1A1CYP3A4TDP1TSHRHTT
SCHEMBL8733142 0.75
SCHEMBL84557 0.73 ALDH1A1 (0.57) ALDH1A1CYP3A4TDP1TSHRHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107817649-B Photosensitive resin composition, polyamide resin and method for producing same, compound and method for producing same, cured film and method for producing same 东京应化工业株式会社 2022-09-16 CN disclosed