SCHEMBL28849170

SCHEMBL28849170

CC(C)(C)OC(=O)C1CN(c2ccccn2)CCCN1

nearest known ligand 0.51

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
GPR119 Q8TDV5 1/20 0.51
ALDH1A1 P00352 6/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
GRM1 Q13255 3/20 0.43
HSD17B10 Q99714 5/20 0.41
KDM4E B2RXH2 3/20 0.41
TSHR P16473 3/20 0.41
LMNA P02545 1/20 0.41
HPGD P15428 3/20 0.40
CYP2C9 P11712 2/20 0.40
CYP2C19 P33261 2/20 0.40
PLD1 Q13393 1/20 0.40
GPBAR1 Q8TDU6 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP2D6 P10635 1/20 0.40
MAPK1 P28482 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5459217 0.76 GFER (0.38) GPR119ALDH1A1HSD17B10KDM4ELMNA
SCHEMBL20677062 0.75 PRKCQ (0.44) GPR119
SCHEMBL29461540 0.72 GPR119 (0.76) GPR119ALDH1A1SMN1; SMN2GRM1HSD17B10
SCHEMBL5473043 0.72 MAPT (0.54) ALDH1A1SMN1; SMN2LMNAMAPK1
SCHEMBL30599874 0.72 PDE10A (0.57) GPR119GRM1
SCHEMBL21227871 0.72 PDE10A (0.57) GPR119GRM1
SCHEMBL12100833 0.71 GRM1 (0.64) GPR119ALDH1A1SMN1; SMN2GRM1HSD17B10
SCHEMBL12100832 0.71 GRM1 (0.64) GPR119ALDH1A1SMN1; SMN2GRM1HSD17B10
SCHEMBL29185950 0.71 MEN1 (0.42) GPR119ALDH1A1SMN1; SMN2MAPK1
SCHEMBL7018379 0.71 WNT3A (0.37) GPR119

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115093794-B Polysilicon polishing composition and application thereof 万华化学集团电子材料有限公司 2023-10-13 CN claimed
CN-115093794-A Polysilicon polishing composition and application thereof 万华化学集团电子材料有限公司 2022-09-23 CN claimed
CN-115093794-A Polysilicon polishing composition and application thereof 万华化学集团电子材料有限公司 2022-09-23 CN disclosed