Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.32 |
| ▸ | LCK | P06239 | 1/20 | 0.32 |
| ▸ | FYN | P06241 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL28434642 | 0.86 | TET2 (0.38) | ALDH1A1TDP1TET2TSHRTP53 | |
| Bicarbonate SCHEMBL18227134 | 0.82 | LMNA (0.41) | ALDH1A1TSHRLMNAFFAR3LCK | |
| Methacrylic Acid SCHEMBL4966973 | 0.82 | TDP1 (0.44) | ALDH1A1TDP1TET2TSHRLMNA | |
| Methacrylic Acid SCHEMBL8586530 | 0.82 | TDP1 (0.44) | ALDH1A1TDP1TET2TSHRLMNA | |
| Methacrylic Acid SCHEMBL3978176 | 0.82 | TDP1 (0.44) | ALDH1A1TDP1TET2TSHRLMNA | |
| Methacrylic Acid SCHEMBL899310 | 0.82 | TDP1 (0.44) | ALDH1A1TDP1TET2TSHRLMNA | |
| Methacrylic Acid SCHEMBL9861111 | 0.81 | ALDH1A1 (0.36) | ALDH1A1TDP1TET2TSHRTP53 | |
| Methacrylic Acid SCHEMBL4171527 | 0.79 | ALDH1A1 (0.44) | ALDH1A1TDP1TSHRTP53LMNA | |
| Methacrylic Acid SCHEMBL29610 | 0.79 | ALDH1A1 (0.44) | ALDH1A1TDP1TSHRTP53LMNA | |
| Methacrylic Acid SCHEMBL539234 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115151868-A | Photosensitive resin composition, method for sorting photosensitive resin composition, method for producing patterned cured film, and method for producing semiconductor device | 昭和电工材料株式会社 | 2022-10-04 | — | — | CN | disclosed |