SCHEMBL28866142

SCHEMBL28866142

CC(C)(O)c1cc(C(C)(C)O)c(OC(=O)c2cccc(C(C)(C)O)c2C(C)(C)O)c(C(C)(C)O)c1

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.33
POLB P06746 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
CYP11B2 P19099 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28087036 0.87 MAPT (0.38) MAPTPOLBNPSR1CYP11B2
SCHEMBL548208 0.77 MAPT (0.33) MAPT
SCHEMBL548408 0.77 ACHE (0.42) MAPTNPSR1
SCHEMBL547547 0.77 MAPT (0.50) MAPTPOLB
SCHEMBL28288486 0.76 HCRTR2 (0.43) MAPTPOLBNPSR1
SCHEMBL548589 0.76
SCHEMBL548334 0.75 MAPT (0.41) MAPTNPSR1
SCHEMBL28218826 0.72 ALOX15 (0.46) MAPT
SCHEMBL18802822 0.72 CYP3A4 (0.35) MAPTPOLB
SCHEMBL4885314 0.67 CA2 (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109690361-A Optical component forms composition 三菱瓦斯化学株式会社 2019-04-26 CN disclosed
CN-103733135-B Resist composition, method for forming resist pattern, polyphenol compound used for the same, and alcohol compound derived from the polyphenol compound 三菱瓦斯化学株式会社 2018-11-27 CN disclosed