SCHEMBL28869330

SCHEMBL28869330

CCCCCCCCC1CCN(N)C1=O

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.40
HTT P42858 2/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
CHRNB2 P17787 1/20 0.38
CHRNA7 P36544 1/20 0.38
CHRNA4 P43681 1/20 0.38
EPHX1 P07099 1/20 0.35
GNAI3 P08754 3/20 0.35
GNAO1 P09471 3/20 0.35
GNAI1 P63096 3/20 0.35
GRM2 Q14416 1/20 0.35
ALDH1A1 P00352 2/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
PPARG P37231 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9488981 0.98 CYP1A2 (0.38) CYP1A2HTTSMN1; SMN2CHRNB2CHRNA7
SCHEMBL6739162 0.89 CHRNB2 (0.44) CYP1A2HTTSMN1; SMN2CHRNB2CHRNA7
SCHEMBL1907356 0.87 CHRNB2 (0.42) CYP1A2HTTSMN1; SMN2CHRNB2CHRNA7
SCHEMBL8333332 0.81 CYP1A2 (0.41) CYP1A2HTTSMN1; SMN2CHRNB2CHRNA7
SCHEMBL31026188 0.81 CYP1A2 (0.41) CYP1A2HTTSMN1; SMN2CHRNB2CHRNA7
SCHEMBL3792450 0.81 CYP1A2 (0.41) CYP1A2HTTSMN1; SMN2CHRNB2CHRNA7
SCHEMBL21596445 0.81 CYP1A2 (0.41) CYP1A2HTTSMN1; SMN2CHRNB2CHRNA7
SCHEMBL4486955 0.81 CYP1A2 (0.41) CYP1A2HTTSMN1; SMN2CHRNB2CHRNA7
Methyl 2-Methylbutanoate SCHEMBL27482259 0.80 GRM2 (0.33) HTTSMN1; SMN2GRM2ALDH1A1
SCHEMBL2145804 0.79 CYP1A2 (0.40) CYP1A2HTTSMN1; SMN2CHRNB2CHRNA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109267073-A Wax removal water and the preparation method and application thereof 深圳市中科东明表面处理新材料技术有限公司 2019-01-25 CN disclosed