⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4613301 | 0.84 | — | — | |
| SCHEMBL2888671 | 0.82 | — | — | |
| SCHEMBL391193 | 0.79 | — | — | |
| SCHEMBL19125242 | 0.78 | NAAA (0.31) | — | |
| SCHEMBL646688 | 0.77 | NFKB1 (0.35) | — | |
| SCHEMBL191028 | 0.76 | — | — | |
| SCHEMBL395746 | 0.74 | — | — | |
| SCHEMBL16892663 | 0.74 | — | — | |
| SCHEMBL391188 | 0.73 | NAAA (0.31) | — | |
| SCHEMBL395750 | 0.73 | NAAA (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8344039-B2 | Three-dimensional pattern forming material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-01-01 | — | — | US | disclosed |
| US-20100286300-A1 | THREE-DIMENSIONAL PATTERN FORMING MATERIAL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-11 | — | — | US | disclosed |
| US-6921623-B2 | Active components and photosensitive resin composition containing the same | KRI, INC. (JP) | 2005-07-26 | — | — | US | disclosed |
| US-6653043-B1 | Mixtures of photoresists, sensitizers and active materials such as silica sol modified by resorcin coupled to silanes, used to improve sensitivity and resolution | KANSAI RESEARCH INSTITUTE, INC. (JP) | 2003-11-25 | — | — | US | disclosed |
| US-20030064320-A1 | Active components and photosensitive resin composition containing the same | KRI, INC. (JP) | 2003-04-03 | — | — | US | disclosed |
| US-6534235-B1 | Photosensitive resin and inorganic particles having a functional group obtained by a reaction between inorganic particles and a coupling agent | KANSAI RESEARCH INSTITUTE, INC. (JP) | 2003-03-18 | — | — | US | disclosed |
| EP-1265103-A1 | ACTIVE COMPONENTS AND PHOTOSENSITIVE RESIN COMPOSITIONS CONTAINING THE SAME | Kansai Research Institute, Inc. (JP) | 2002-12-11 | — | — | EP | disclosed |
| EP-1096313-A1 | Active particle, photosensitive resin composition, and process for forming pattern | Kansai Research Institute, Inc. (JP) | 2001-05-02 | — | — | EP | disclosed |