SCHEMBL28891978

SCHEMBL28891978

CC(=O)c1cc2ccc3cccc4ccc(c1O)c2c34

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 0.49
ALDH1A1 P00352 5/20 0.49
HPGD P15428 4/20 0.49
MAPT P10636 3/20 0.49
KMT2A Q03164 6/20 0.49
MEN1 O00255 5/20 0.49
POLB P06746 2/20 0.49
NSD2 O96028 1/20 0.49
MCL1 Q07820 1/20 0.49
CYP1A2 P05177 3/20 0.44
MAOA P21397 2/20 0.44
ERBB2 P04626 1/20 0.44
FYN P06241 1/20 0.44
ACHE P22303 1/20 0.44
AHR P35869 1/20 0.44
HSD17B10 Q99714 3/20 0.43
MAOB P27338 2/20 0.43
TSHR P16473 2/20 0.43
GLA P06280 1/20 0.43
CYP2D6 P10635 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2535448 0.85 KMT2A (0.55) KDM4EALDH1A1HPGDMAPTKMT2A
SCHEMBL21972843 0.84 ALDH1A1 (0.44) KDM4EALDH1A1HPGDMAPTKMT2A
SCHEMBL1976674 0.84 ALDH1A1 (0.49) KDM4EALDH1A1HPGDMAPTKMT2A
SCHEMBL1666346 0.83 ALDH1A1 (0.49) KDM4EALDH1A1HPGDMAPTKMT2A
SCHEMBL29537012 0.80 ALDH1A1 (0.57) KDM4EALDH1A1HPGDMAPTKMT2A
SCHEMBL308494 0.80 ALDH1A1 (0.57) KDM4EALDH1A1HPGDMAPTKMT2A
SCHEMBL21972844 0.80 KMT2A (0.41) KDM4EALDH1A1HPGDMAPTKMT2A
SCHEMBL28892012 0.80 HPGD (0.45) KDM4EALDH1A1HPGDMAPTKMT2A
Ammonia Solution, Strong SCHEMBL27248401 0.79 ALDH1A1 (0.56) KDM4EALDH1A1HPGDMAPTKMT2A
SCHEMBL17256438 0.77 MEN1 (0.46) KDM4EALDH1A1HPGDMAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115202153-A Hard mask composition, hard mask layer and method for forming pattern 三星SDI株式会社 2022-10-18 CN claimed
US-20220315790-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2022-10-06 US claimed
CN-115202153-A Hard mask composition, hard mask layer and method for forming pattern 三星SDI株式会社 2022-10-18 CN disclosed
US-20220315790-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2022-10-06 US disclosed