SCHEMBL28892012

SCHEMBL28892012

COc1c(C(C)=O)cc2ccc3cccc4ccc1c2c34

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 7/20 0.45
ALDH1A1 P00352 7/20 0.45
KDM4E B2RXH2 6/20 0.45
MAPT P10636 3/20 0.45
NPSR1 Q6W5P4 1/20 0.42
CYP1A2 P05177 3/20 0.41
KMT2A Q03164 2/20 0.41
ERBB2 P04626 1/20 0.41
FYN P06241 1/20 0.41
MAOA P21397 1/20 0.41
ACHE P22303 1/20 0.41
AHR P35869 1/20 0.41
MEN1 O00255 1/20 0.41
HSD17B10 Q99714 3/20 0.40
GLA P06280 1/20 0.40
POLB P06746 1/20 0.40
CYP2D6 P10635 1/20 0.40
CYP3A4 P08684 1/20 0.40
TSHR P16473 1/20 0.40
TDP1 Q9NUW8 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29970006 0.84 ALDH1A1 (0.42) HPGDALDH1A1KDM4EMAPTNPSR1
SCHEMBL17256442 0.81 ABCG2 (0.45) HPGDALDH1A1KDM4EMAPTNPSR1
SCHEMBL1976674 0.80 ALDH1A1 (0.49) HPGDALDH1A1KDM4EMAPTNPSR1
SCHEMBL1666346 0.80 ALDH1A1 (0.49) HPGDALDH1A1KDM4EMAPTNPSR1
SCHEMBL28891978 0.80 KDM4E (0.49) HPGDALDH1A1KDM4EMAPTNPSR1
SCHEMBL28891976 0.78 CYP1A2 (0.46) HPGDALDH1A1KDM4EMAPTCYP1A2
SCHEMBL29537012 0.77 ALDH1A1 (0.57) HPGDALDH1A1KDM4EMAPTNPSR1
SCHEMBL308494 0.77 ALDH1A1 (0.57) HPGDALDH1A1KDM4EMAPTNPSR1
SCHEMBL27869644 0.76 NPC1 (0.54) HPGDALDH1A1KDM4EMAPTCYP1A2
SCHEMBL7218459 0.76 ALDH1A1 (0.55) HPGDALDH1A1KDM4EMAPTCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220315790-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2022-10-06 US claimed
CN-115202153-A Hard mask composition, hard mask layer and method for forming pattern 三星SDI株式会社 2022-10-18 CN disclosed
US-20220315790-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2022-10-06 US disclosed