SCHEMBL28892002

SCHEMBL28892002

COc1cc2ccc3cccc4ccc(c1C=O)c2c34

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.42
ERBB2 P04626 1/20 0.42
FYN P06241 1/20 0.42
MAOA P21397 1/20 0.42
ACHE P22303 1/20 0.42
AHR P35869 1/20 0.42
NPC1 O15118 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
MAPT P10636 4/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
ERN1 O75460 3/20 0.41
L3MBTL1 Q9Y468 3/20 0.41
HPGD P15428 3/20 0.41
ALDH1A1 P00352 3/20 0.41
TDP1 Q9NUW8 2/20 0.41
CYP3A4 P08684 1/20 0.41
TSHR P16473 1/20 0.41
HSD17B10 Q99714 1/20 0.41
GAA P10253 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14639413 0.82 ALDH1A1 (0.53) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL28891984 0.81 L3MBTL1 (0.40) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL16241709 0.78 CYP1A2 (0.52) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL548370 0.77 CYP1A2 (0.47) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL27869644 0.77 NPC1 (0.54) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL28891982 0.76 ALDH1A1 (0.38) CYP1A2NPC1SMN1; SMN2MAPTCYP2C9
SCHEMBL29968575 0.76 ALDH1A1 (0.38) CYP1A2NPC1SMN1; SMN2MAPTCYP2C9
Formaldehyde SCHEMBL28892043 0.76 NPC1 (0.54) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL8003744 0.76 CYP1A2 (0.46) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL16342785 0.76 CYP1A2 (0.46) CYP1A2ERBB2FYNMAOAACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115202153-A Hard mask composition, hard mask layer and method for forming pattern 三星SDI株式会社 2022-10-18 CN claimed
US-20220315790-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2022-10-06 US claimed
CN-115202153-A Hard mask composition, hard mask layer and method for forming pattern 三星SDI株式会社 2022-10-18 CN disclosed
US-20220315790-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2022-10-06 US disclosed