Formaldehyde

Formaldehyde

SCHEMBL28892005

C=O.OCOc1ccc2ccc3cccc4ccc1c2c34

nearest known ligand 0.44

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.44
MEN1 O00255 3/20 0.44
HPGD P15428 7/20 0.41
ALDH1A1 P00352 6/20 0.41
CYP1A2 P05177 5/20 0.41
HSD17B10 Q99714 4/20 0.41
KDM4E B2RXH2 4/20 0.41
GLA P06280 1/20 0.41
POLB P06746 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP3A4 P08684 2/20 0.40
TSHR P16473 2/20 0.40
TDP1 Q9NUW8 2/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
MAPT P10636 1/20 0.39
CYP1A1 P04798 1/20 0.38
CYP1B1 Q16678 1/20 0.38
ERBB2 P04626 1/20 0.38
FYN P06241 1/20 0.38
MAOA P21397 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29968561 0.95 ALDH1A1 (0.44) KMT2AMEN1HPGDALDH1A1CYP1A2
SCHEMBL28892006 0.95 ALDH1A1 (0.44) KMT2AMEN1HPGDALDH1A1CYP1A2
SCHEMBL8064322 0.81 IDO1 (0.50) KMT2AMEN1HPGDALDH1A1CYP1A2
SCHEMBL19138188 0.79 CNR2 (0.51) KMT2AMEN1HPGDALDH1A1CYP1A2
SCHEMBL12486529 0.79 CYP1A2 (0.59) KMT2AMEN1HPGDALDH1A1CYP1A2
SCHEMBL29440259 0.78 KDM4E (0.63) KMT2AMEN1HPGDALDH1A1CYP1A2
SCHEMBL667406 0.78 KDM4E (0.63) KMT2AMEN1HPGDALDH1A1CYP1A2
SCHEMBL28892041 0.77 HPGD (0.47) KMT2AMEN1HPGDALDH1A1CYP1A2
SCHEMBL327681 0.77 ALDH1A1 (0.48) KMT2AMEN1HPGDALDH1A1CYP1A2
SCHEMBL28407324 0.77 ALDH1A1 (0.44) KMT2AMEN1HPGDALDH1A1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115202153-A Hard mask composition, hard mask layer and method for forming pattern 三星SDI株式会社 2022-10-18 CN disclosed