SCHEMBL29968561

SCHEMBL29968561

OCOc1ccc2ccc3cccc4ccc1c2c34

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.44
HPGD P15428 6/20 0.44
HSD17B10 Q99714 4/20 0.44
CYP3A4 P08684 2/20 0.44
TSHR P16473 2/20 0.44
TDP1 Q9NUW8 2/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
KMT2A Q03164 3/20 0.44
MEN1 O00255 2/20 0.44
CYP1A2 P05177 5/20 0.42
CYP1A1 P04798 1/20 0.42
CYP1B1 Q16678 1/20 0.42
ERBB2 P04626 1/20 0.41
FYN P06241 1/20 0.41
MAOA P21397 1/20 0.41
ACHE P22303 1/20 0.41
AHR P35869 1/20 0.41
KDM4E B2RXH2 5/20 0.40
GLA P06280 1/20 0.40
POLB P06746 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28892006 1.00 ALDH1A1 (0.44) ALDH1A1HPGDHSD17B10CYP3A4TSHR
Formaldehyde SCHEMBL28892005 0.95 KMT2A (0.44) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL8064322 0.85 IDO1 (0.50) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL19138188 0.84 CNR2 (0.51) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL12486529 0.83 CYP1A2 (0.59) ALDH1A1HPGDHSD17B10TSHRTDP1
SCHEMBL28407324 0.81 ALDH1A1 (0.44) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL327681 0.81 ALDH1A1 (0.48) ALDH1A1HPGDHSD17B10CYP3A4TSHR
SCHEMBL2562377 0.80 CYP1A2 (0.65) ALDH1A1HSD17B10TSHRTDP1KMT2A
SCHEMBL29440259 0.79 KDM4E (0.63) ALDH1A1HPGDHSD17B10TDP1L3MBTL1
SCHEMBL667406 0.79 KDM4E (0.63) ALDH1A1HPGDHSD17B10TDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220315790-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2022-10-06 US claimed
JP-2022159999-A HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD FOR FORMING PATTERNS 三星エスディアイ株式会社 2022-10-18 JP disclosed
US-20220315790-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2022-10-06 US disclosed