SCHEMBL28933760

SCHEMBL28933760

CCCP(=O)(CCC)CC[Si](OC)(OC)OC

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28933761 0.87 LMNA (0.40) LMNAL3MBTL1
SCHEMBL28933746 0.84 LMNA (0.31) LMNA
SCHEMBL28540109 0.80 L3MBTL1 (0.33) L3MBTL1
SCHEMBL28933743 0.78 L3MBTL1 (0.32) L3MBTL1
SCHEMBL563253 0.74 L3MBTL1 (0.48) L3MBTL1
SCHEMBL28933773 0.73
SCHEMBL29046176 0.72 HPGD (0.31)
SCHEMBL9506353 0.71
SCHEMBL9796590 0.71
SCHEMBL7595369 0.71 TYMS (0.39) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115584262-A Chemical etching composition and application thereof 安集微电子(上海)有限公司 2023-01-10 CN claimed
CN-115584263-A Chemical etching composition and application thereof 安集微电子(上海)有限公司 2023-01-10 CN claimed
CN-115584262-A Chemical etching composition and application thereof 安集微电子(上海)有限公司 2023-01-10 CN disclosed
CN-115584263-A Chemical etching composition and application thereof 安集微电子(上海)有限公司 2023-01-10 CN disclosed