SCHEMBL7595369

SCHEMBL7595369

CO[Si](CCP(=O)(O)O)(OC)OC

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TYMS P04818 1/20 0.39
ALDH1A1 P00352 3/20 0.36
LPAR3 Q9UBY5 3/20 0.36
LPAR2 Q9HBW0 1/20 0.36
BBOX1 O75936 2/20 0.34
GRM4 Q14833 1/20 0.34
LMNA P02545 1/20 0.33
CYP3A4 P08684 1/20 0.33
NFKB1 P19838 1/20 0.33
BLM P54132 1/20 0.33
PMP22 Q01453 1/20 0.33
ANPEP P15144 1/20 0.33
TDP1 Q9NUW8 1/20 0.32
BTN3A1 O00481 1/20 0.31
KDM4E B2RXH2 1/20 0.30
MMP2 P08253 1/20 0.30
THRB P10828 1/20 0.30
MAPK1 P28482 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13789577 0.87 TYMS (0.39) TYMSALDH1A1LPAR3LPAR2BBOX1
SCHEMBL7598369 0.86 TYMS (0.48) TYMSALDH1A1LPAR3LPAR2BBOX1
Hydrochloric Acid SCHEMBL10410977 0.84 TYMS (0.46) TYMSALDH1A1LPAR3LPAR2BBOX1
SCHEMBL2616664 0.84 LPAR3 (0.46) TYMSALDH1A1LPAR3LPAR2BBOX1
SCHEMBL16268573 0.83 ALDH1A1 (0.34) TYMSALDH1A1ANPEPTDP1
SCHEMBL19638556 0.80 LAP3 (0.32) LPAR3LPAR2
SCHEMBL12088790 0.79 LMNA (0.45) TYMSALDH1A1LPAR3LPAR2LMNA
SCHEMBL17678569 0.78 TYMS (0.38) TYMSALDH1A1LPAR3LPAR2BBOX1
SCHEMBL7593811 0.78 GRM4 (0.34) TYMSALDH1A1LPAR3LPAR2BBOX1
SCHEMBL2596965 0.78 S1PR2 (0.46) TYMSLPAR3LPAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0985702-B1 Flame retardant dispersion composition CONSORTIUM ELEKTROCHEM IND (DE) 2002-11-27 EP claimed
CN-106496374-A A kind of catalyst system and its application for preparing olefin polymer 中国石油化工股份有限公司 2017-03-15 CN disclosed
US-20080207849-A1 HYDROPHILIC FILM FORMING COMPOSITION AND HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-0318820-B1 PROCESS FOR ANODISING SURFACES OF ALUMINIUM OR ALUMINIUM ALLOYS BASF Aktiengesellschaft (DE) 1992-03-18 EP disclosed
US-5073475-A PRODUCTION OF PLATE-LIKE, SHEET-LIKE OR TAPE-LIKE MATERIALS AND OF SENSITIZED LITHOGRAPHIC PRINTING PLATES BASF AKTIENGESELLSCHAFT (DE) 1991-12-17 US disclosed
EP-0418575-A2 Process for the manufacture of plates, foils, or sheet-like materials and process for the manufacture of presensitized lithographic printing plates BASF Aktiengesellschaft (DE) 1991-03-27 EP disclosed
US-4970138-A Damping solution for offset printing BASF AKTIENGESELLSCHAFT (DE) 1990-11-13 US disclosed
US-4939068-A Silane containing acid BASF AKTIENGESELLSCHAFT (DE) 1990-07-03 US disclosed
US-4935332-A Photosensitive element having an aluminum base and silane intermediate layer BASF AKTIENGESELLSCHAFT (DE) 1990-06-19 US disclosed
EP-0318820-A2 Process for anodising surfaces of aluminium or aluminium alloys BASF Aktiengesellschaft (DE) 1989-06-07 EP disclosed
US-4782000-A Electrophotographic recording elements with hydrolyzed silane layer BASF AKTIENGESELLSCHAFT (DE) 1988-11-01 US disclosed