SCHEMBL2893408

SCHEMBL2893408

C=CC(=O)OC(C1CCCC1)C1CCCC1

nearest known ligand 0.34

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 2/20 0.34
ALDH1A1 P00352 5/20 0.33
NPSR1 Q6W5P4 1/20 0.33
TSHR P16473 5/20 0.32
GAA P10253 1/20 0.31
TP53 P04637 2/20 0.30
HIF1A Q16665 2/20 0.30
CYP3A4 P08684 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8405379 0.98 EPHX1 (0.38) EPHX1ALDH1A1NPSR1TSHRGAA
SCHEMBL6065974 0.98 EPHX1 (0.38) EPHX1ALDH1A1NPSR1TSHRGAA
SCHEMBL6066260 0.98 EPHX1 (0.38) EPHX1ALDH1A1NPSR1TSHRGAA
SCHEMBL21249348 0.87
SCHEMBL30819868 0.83 EPHX1 (0.34) EPHX1ALDH1A1NPSR1TSHRGAA
SCHEMBL22129735 0.82 TSHR (0.39) EPHX1ALDH1A1NPSR1TSHRGAA
SCHEMBL1774088 0.80 TSHR (0.38) EPHX1ALDH1A1NPSR1TSHRGAA
SCHEMBL12791624 0.80 NPSR1 (0.35) EPHX1ALDH1A1NPSR1TSHRGAA
SCHEMBL23493922 0.76 ALDH1A1 (0.38) EPHX1ALDH1A1NPSR1TSHRGAA
SCHEMBL28298605 0.75 TSHR (0.44) EPHX1ALDH1A1NPSR1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106226999-A A kind of method at the rapidly coating photoresists in half tone surface 村上精密制版(昆山)有限公司 2016-12-14 CN claimed
CN-102070744-B Binder resin for resist ink and resist ink using the same DNP FINE CHEMICALS CO LTD 2014-12-17 CN claimed
US-7807592-B2 Interior wallboard and method of making same GEORGIA-PACIFIC GYPSUM LLC (US) 2010-10-05 US claimed
US-20250361406-A1 RADIATION-CURING COMPOSITION FOR THE PRODUCTION OF DENTAL COMPONENTS KULZER GMBH (DE) 2025-11-27 US disclosed
US-20250361349-A1 MONOMER MIXTURE FOR PRODUCING A DENTAL MATERIAL MUEHLBAUER TECH GMBH (DE) 2025-11-27 US disclosed
EP-4652981-A1 RADIATION-CURABLE COMPOSITION FOR THE PRODUCTION OF DENTAL COMPONENTS Kulzer GmbH (DE) 2025-11-26 EP disclosed
US-20250297044-A1 RADIATION-CURABLE COMPOSITION FOR USE IN A RAPID PROTOTYPING PROCESS OR A RAPID MANUFACTURING PROCESS KULZER GMBH (DE) 2025-09-25 US disclosed
WO-2025099123-A1 RADIATION-CURING COMPOSITION FOR PRODUCING DENTAL COMPONENTS IN A 3D PRINTING PROCESS KULZER GMBH (DE) 2025-05-15 WO disclosed
EP-4551180-A1 MONOMER MIXTURE FOR PRODUCING A DENTAL MATERIAL Mühlbauer Technology GmbH (DE) 2025-05-14 EP disclosed
EP-4518794-A1 RADIATION-CURABLE COMPOSITION FOR USE IN A RAPID PROTOTYPING PROCESS OR A RAPID MANUFACTURING PROCESS Kulzer GmbH (DE) 2025-03-12 EP disclosed
WO-2024008569-A1 MONOMER MIXTURE FOR PRODUCING A DENTAL MATERIAL MÜHLBAUER TECHNOLOGY GMBH (DE) 2024-01-11 WO disclosed
CN-102307909-B Photosensitive resin composition SAN APRO LTD 2014-05-07 CN disclosed
CN-103116246-A Photosensitive resin composition and application thereof MURAKAMI PREC STENCIL KUNSHAN CO LTD 2013-05-22 CN disclosed
US-20120261186-A1 METHOD FOR PRODUCING WIRING HARNESS, AND WIRING HARNESS AUTONETWORKS TECHNOLOGIES, LTD. (JP) 2012-10-18 US disclosed
CN-101833241-B Photosensitive resin composition MURAKAMI KUNSHAN CO LTD 2012-07-04 CN disclosed
US-20100285221-A1 INK COMPOSITION FOR INK JET RECORDING SEIKO EPSON CORPORATION 2010-11-11 US disclosed
CN-101833241-A Photosensitive resin composition MURAKAMI KUNSHAN CO LTD 2010-09-15 CN disclosed
CN-1931917-A Aqueous resin dispersion, aqueous resin composition and method for producing aqueous resin composition NIPPON CATALYTIC CHEM IND (JP) 2007-03-21 CN disclosed
US-20060172136-A1 Coated member SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-08-03 US disclosed
EP-1361392-A1 SURFACE LIGHT SOURCE SYSTEM AND OPTICAL DEFLECTION ELEMENT Mitsubishi Rayon Co., Ltd. (JP) 2003-11-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250361349-A1 MONOMER MIXTURE FOR PRODUCING A DENTAL MATERIAL PGM2, ALG3, KCNMA1 EPHX1 1752/4885ALDH1A1 1622/4885NPSR1 2657/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.