Fumaric Acid

Fumaric Acid

SCHEMBL28937804

CCc1nc(C)c[nH]1.CCc1nc(C)c[nH]1.O=C(O)/C=C/C(=O)O

nearest known ligand 0.36

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Known targets — ChEMBL curated mechanism

ADRB1ADRB2ATP4AATP4BAXLCHRM2CHRM3DRD2FLT3HRH1HTR2AHTR2BHTR2CKCNH2KMT2AMAP2K1MAP2K2MEN1MLNRPLK4RENS1PR1SLC6A2SLC6A4atpAatpBatpCatpDatpEatpFatpFHatpGpol

The experimentally established mechanism targets of Fumaric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A known ✓ P28223 1/20 0.32
HTR2C known ✓ P28335 1/20 0.32
HRH1 known ✓ P35367 1/20 0.32
HTR2B known ✓ P41595 1/20 0.32
KMT2A known ✓ Q03164 1/20 0.31
HCAR2 Q8TDS4 1/20 0.36
TSHR P16473 3/20 0.35
NPSR1 Q6W5P4 2/20 0.35
KDM4E B2RXH2 2/20 0.35
BLM P54132 1/20 0.35
CYP3A4 P08684 1/20 0.35
LMNA P02545 2/20 0.33
MAPT P10636 2/20 0.33
ALDH1A1 P00352 2/20 0.33
THRB P10828 1/20 0.33
HPGD P15428 1/20 0.33
HTT P42858 1/20 0.33
HTR1A P08908 1/20 0.32
ADRA2A P08913 1/20 0.32
ADRA2B P18089 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL11221125 0.87 TP53 (0.33) HCAR2KDM4EMAPTHTTKMT2A
Hydrogen Peroxide SCHEMBL28136903 0.87 ADORA1 (0.36) HTTTP53
SCHEMBL28138740 0.83 ADORA1 (0.38) HTTTP53
SCHEMBL17688 0.83
Lactic Acid SCHEMBL11231786 0.81 TP53 (0.37) KDM4ELMNAMAPTALDH1A1HPGD
Water SCHEMBL28756842 0.81
Ammonia Solution, Strong SCHEMBL28173798 0.81
Bromide SCHEMBL8534627 0.81
SCHEMBL11854680 0.81
SCHEMBL27353369 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114207043-B Composition for producing siliceous film having low dielectric constant and method for producing cured film and electronic device using the same 默克专利有限公司 2023-09-15 CN claimed
EP-4010441-B1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2023-09-06 EP claimed
US-11512171-B2 Low dielectric constant siliceous film manufacturing composition and methods for producing cured film and electronic device using the same MERCK PATENT GMBH (DE) 2022-11-29 US claimed
US-20220267532-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2022-08-25 US claimed
EP-4010441-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME Merck Patent GmbH (DE) 2022-06-15 EP claimed
CN-114207043-A Composition for producing low dielectric constant siliceous film and method for producing cured film and electronic device using the same 默克专利有限公司 2022-03-18 CN claimed
EP-4010441-B1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2023-09-06 EP disclosed
US-11512171-B2 Low dielectric constant siliceous film manufacturing composition and methods for producing cured film and electronic device using the same MERCK PATENT GMBH (DE) 2022-11-29 US disclosed
US-20220267532-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2022-08-25 US disclosed
EP-4010441-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME Merck Patent GmbH (DE) 2022-06-15 EP disclosed
CN-114207043-A Composition for producing low dielectric constant siliceous film and method for producing cured film and electronic device using the same 默克专利有限公司 2022-03-18 CN disclosed