SCHEMBL28949883

SCHEMBL28949883

CN([SiH](C)C)[Si](C)(C)Cc1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.40
TSHR P16473 1/20 0.40
AOC3 Q16853 3/20 0.38
TAAR1 Q96RJ0 1/20 0.38
LMNA P02545 1/20 0.35
TP53 P04637 1/20 0.34
CARM1 Q86X55 1/20 0.33
PRMT6 Q96LA8 1/20 0.33
PRMT8 Q9NR22 1/20 0.33
NR1H2 P55055 1/20 0.33
NR1H3 Q13133 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
ALOX15 P16050 1/20 0.33
CYP2C19 P33261 1/20 0.33
SIGMAR1 Q99720 1/20 0.33
PIM1 P11309 1/20 0.33
NPC1 O15118 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1525916 0.81 TAAR1 (0.44) ALDH1A1TSHRAOC3TAAR1SIGMAR1
SCHEMBL8777923 0.79 TSHR (0.46) ALDH1A1TSHRAOC3TAAR1LMNA
SCHEMBL27884955 0.73 ALDH1A1 (0.41) ALDH1A1TSHRAOC3TAAR1LMNA
Benzylamine SCHEMBL27603574 0.73 LOXL2 (0.52) ALDH1A1TSHRAOC3TAAR1CARM1
SCHEMBL3474263 0.71 ALDH1A1 (0.39) ALDH1A1TSHRAOC3TAAR1LMNA
SCHEMBL15949871 0.69 ALDH1A1 (0.41) ALDH1A1TSHRAOC3TAAR1TP53
Bromide SCHEMBL821354 0.69 TSHR (0.37) ALDH1A1TSHRAOC3TAAR1LMNA
Iodide SCHEMBL822284 0.69 TSHR (0.37) ALDH1A1TSHRAOC3TAAR1LMNA
Hydrochloric Acid SCHEMBL821914 0.69 ALDH1A1 (0.37) ALDH1A1TSHRAOC3TAAR1LMNA
Iodide SCHEMBL822286 0.69 TSHR (0.37) ALDH1A1TSHRAOC3TAAR1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115699259-A Surface treatment method for semiconductor substrate and surface treatment agent composition 中央硝子株式会社 2023-02-03 CN disclosed