SCHEMBL2898286

SCHEMBL2898286

O=C1c2ccccc2C(=O)N1OS(=O)(=O)c1c(F)c(F)c(F)c(F)c1F

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 8/20 0.66
MEN1 O00255 5/20 0.66
KDM4E B2RXH2 10/20 0.62
ALDH1A1 P00352 10/20 0.62
MAPT P10636 9/20 0.62
HPGD P15428 7/20 0.62
XBP1 P17861 2/20 0.60
CYP1A2 P05177 1/20 0.60
CYP3A4 P08684 1/20 0.60
CYP2C19 P33261 1/20 0.60
NPSR1 Q6W5P4 1/20 0.60
VDR P11473 3/20 0.57
F2 P00734 4/20 0.53
HTT P42858 3/20 0.53
LMNA P02545 2/20 0.53
SMN1; SMN2 Q16637 1/20 0.53
THRB P10828 1/20 0.42
POLB P06746 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
GAA P10253 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL60582 0.86 KDM4E (0.65) KMT2AMEN1KDM4EALDH1A1MAPT
SCHEMBL12339105 0.85 KMT2A (0.64) KMT2AMEN1KDM4EALDH1A1MAPT
SCHEMBL2902793 0.82 KMT2A (0.45) KMT2AMEN1KDM4EALDH1A1MAPT
SCHEMBL3825755 0.82 KDM4E (0.46) KMT2AMEN1KDM4EALDH1A1MAPT
SCHEMBL16883339 0.81 MAPT (0.46) KMT2AMEN1KDM4EALDH1A1MAPT
SCHEMBL60581 0.80 KMT2A (0.45) KMT2AMEN1KDM4EALDH1A1MAPT
SCHEMBL14509478 0.79 KDM4E (0.60) KMT2AMEN1KDM4EALDH1A1MAPT
SCHEMBL2468373 0.79 KMT2A (1.00) KMT2AMEN1KDM4EALDH1A1MAPT
SCHEMBL22504942 0.79 KDM4E (0.62) KMT2AMEN1KDM4EALDH1A1MAPT
SCHEMBL17195064 0.78 KMT2A (0.47) KMT2AMEN1KDM4EALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 159 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP claimed
US-20200225599-A1 LIQUID DEVELOPER AND METHOD FOR MANUFACTURING LIQUID DEVELOPER CANON KABUSHIKI KAISHA (JP) 2020-07-16 US disclosed
US-10545424-B2 Liquid developer and method of producing liquid developer CANON KABUSHIKI KAISHA (JP) 2020-01-28 US disclosed
US-10423084-B2 Method for producing liquid developer CANON KABUSHIKI KAISHA (JP) 2019-09-24 US disclosed
US-20190271929-A1 LIQUID DEVELOPER AND METHOD FOR MANUFACTURING LIQUID DEVELOPER CANON KABUSHIKI KAISHA (JP) 2019-09-05 US disclosed
US-20190155180-A1 METHOD FOR PRODUCING LIQUID DEVELOPER CANON KABUSHIKI KAISHA (JP) 2019-05-23 US disclosed
US-20190094734-A1 LIQUID DEVELOPER AND METHOD OF PRODUCING LIQUID DEVELOPER CANON KABUSHIKI KAISHA (JP) 2019-03-28 US disclosed
US-10175597-B2 Liquid developer and method of producing same CANON KABUSHIKI KAISHA (JP) 2019-01-08 US disclosed
US-20180143546-A1 METHOD FOR PRODUCING CURABLE LIQUID DEVELOPER CANON KABUSHIKI KAISHA (JP) 2018-05-24 US disclosed
US-20180143546-A1 METHOD FOR PRODUCING CURABLE LIQUID DEVELOPER CANON KABUSHIKI KAISHA (JP) 2018-05-24 US disclosed
EP-1253470-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-10-30 EP disclosed
EP-1238972-A1 Novel carbazole derivative and chemically amplified radiation-sensitive resin composition JSR Corporation (JP) 2002-09-11 EP disclosed
EP-1231205-A1 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2002-08-14 EP disclosed
US-20020012872-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-31 US disclosed
EP-1164433-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
EP-0827970-B1 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT FINANCE BVI LTD (VG) 2001-09-26 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed
US-5852128-A Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT AG (CH) 1998-12-22 US disclosed
EP-0827970-A2 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials Clariant AG (CH) 1998-03-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10175597-B2 Liquid developer and method of producing same AUP1, RCC1, CBR1 KMT2A 2179/4885MEN1 233/4885KDM4E 1436/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.