Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 8/20 | 0.45 |
| ▸ | MEN1 | O00255 | 5/20 | 0.45 |
| ▸ | MAPT | P10636 | 10/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.42 |
| ▸ | HPGD | P15428 | 7/20 | 0.42 |
| ▸ | HTT | P42858 | 3/20 | 0.42 |
| ▸ | XBP1 | P17861 | 2/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.42 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | VDR | P11473 | 2/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL462228 | 0.85 | KMT2A (0.66) | KMT2AMEN1MAPTKDM4EALDH1A1 | |
| SCHEMBL72297 | 0.83 | ALDH1A1 (0.63) | KMT2AMEN1MAPTKDM4EALDH1A1 | |
| SCHEMBL548394 | 0.82 | ALDH1A1 (0.47) | KMT2AMEN1MAPTKDM4EALDH1A1 | |
| SCHEMBL2898286 | 0.80 | KMT2A (0.66) | KMT2AMEN1MAPTKDM4EALDH1A1 | |
| SCHEMBL65319 | 0.80 | MAPT (0.47) | KMT2AMEN1MAPTKDM4EALDH1A1 | |
| SCHEMBL184225 | 0.79 | DNMT1 (0.42) | KMT2AMEN1MAPTKDM4EALDH1A1 | |
| SCHEMBL462046 | 0.79 | VDR (0.68) | KMT2AMEN1MAPTKDM4EALDH1A1 | |
| SCHEMBL547930 | 0.78 | KMT2A (0.50) | KMT2AMEN1MAPTKDM4EALDH1A1 | |
| SCHEMBL461884 | 0.78 | KMT2A (0.40) | KMT2AMEN1MAPTKDM4EALDH1A1 | |
| SCHEMBL7782937 | 0.77 | DNMT1 (0.43) | KMT2AMEN1MAPTKDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 441 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240077802-A1 | METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-03-07 | — | — | US | claimed |
| US-11626293-B2 | Method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-04-11 | — | — | US | claimed |
| US-20220230889-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-07-21 | — | — | US | claimed |
| US-8557943-B2 | Nanostructured organosilicates from thermally curable block copolymers | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-15 | — | — | US | claimed |
| US-8426113-B2 | Chemically amplified silsesquioxane resist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-04-23 | — | — | US | claimed |
| WO-2012148659-A2 | NANOSTRUCTURED ORGANOSILICATES FROM THERMALLY CURABLE BLOCK COPOLYMERS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-01 | — | — | WO | claimed |
| US-20120277339-A1 | Nanostructured Organosilicates from Thermally Curable Block Copolymers | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-01 | — | — | US | claimed |
| US-8262961-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-11 | — | — | US | claimed |
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | claimed |
| US-20120040289-A1 | CHEMICALLY AMPLIFIED SILSESQUIOXANE RESIST COMPOSITIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-02-16 | — | — | US | claimed |
| US-20080174051-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-24 | — | — | US | claimed |
| US-20080169268-A1 | PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-17 | — | — | US | claimed |
| US-7358029-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | claimed |
| US-20070298176-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2007-12-27 | — | — | US | claimed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | claimed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | claimed |
| US-6365321-B1 | COPOLYMER WITH ACRYLATE HAVING ACID LABILE GROUP, HOMOGENOUSLY BLENDED WITH PHENOLIC POLYMER WHICH IS PARTIALLY OR WHOLLY PROTECTED | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-04-02 | — | — | US | claimed |
| EP-0605089-B1 | Photoresist composition | IBM (US) | 1999-01-07 | — | — | EP | claimed |
| US-5492793-A | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-02-20 | — | — | US | claimed |
| EP-0605089-A2 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-07-06 | — | — | EP | claimed |