SCHEMBL28990185

SCHEMBL28990185

Cc1cc(C)c(C(=O)C(=O)c2ccccc2)c(C)c1.O=[PH](c1ccccc1)c1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CES2 O00748 12/20 0.49
CES1 P23141 11/20 0.49
NPSR1 Q6W5P4 2/20 0.38
HPGD P15428 1/20 0.38
MCOLN3 Q8TDD5 1/20 0.38
KMT2A Q03164 3/20 0.38
RAB9A P51151 2/20 0.38
MEN1 O00255 2/20 0.37
LMNA P02545 1/20 0.37
MAPT P10636 1/20 0.37
CRHBP P24387 1/20 0.37
CRHR2 Q13324 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9646505 0.88 CES2 (0.61) CES2CES1NPSR1HPGDMCOLN3
SCHEMBL28388430 0.87 KMT2A (0.46) CES2CES1NPSR1HPGDMCOLN3
SCHEMBL28301910 0.83 KDM4E (0.41) HPGDKMT2AMEN1LMNA
SCHEMBL28323807 0.81 KMT2A (0.38) NPSR1HPGDMCOLN3KMT2ARAB9A
SCHEMBL29074531 0.81 KDM4E (0.40) HPGDKMT2AMEN1LMNAMAPT
SCHEMBL28990183 0.78 CES2 (0.49) CES2CES1NPSR1HPGDMCOLN3
Benzoyl Formic Acid SCHEMBL28308036 0.78 CES2 (0.41) CES2CES1NPSR1HPGDMCOLN3
SCHEMBL27187028 0.76 ALOX5 (0.44) KMT2AMEN1LMNAMAPT
SCHEMBL1377101 0.75 ACHE (0.41) CES2CES1NPSR1LMNAMAPT
Benzil SCHEMBL27849222 0.75 CES2 (0.74) CES2CES1KMT2ARAB9AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116249939-A Photosensitive transfer material, method for producing resin pattern, method for producing circuit wiring, and method for producing electronic device 富士胶片株式会社 2023-06-09 CN disclosed
CN-116034029-A Photosensitive transfer material, method for producing resin pattern, method for producing conductive pattern, and touch sensor 富士胶片株式会社 2023-04-28 CN disclosed
CN-116018559-A Photosensitive transfer material and method for producing resin pattern 富士胶片株式会社 2023-04-25 CN disclosed