SCHEMBL28990965

SCHEMBL28990965

C=CCOCC=C.C=Cc1ccccc1O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRIM24 O15164 1/20 0.42
TRIM33 Q9UPN9 1/20 0.42
CA2 P00918 7/20 0.41
CA12 O43570 6/20 0.41
KDM4E B2RXH2 1/20 0.41
HPGD P15428 1/20 0.41
TSHR P16473 1/20 0.41
MAPK1 P28482 1/20 0.41
HSD17B10 Q99714 1/20 0.41
CA9 Q16790 5/20 0.39
CYP3A4 P08684 1/20 0.39
TRPA1 O75762 1/20 0.38
ALDH1A1 P00352 1/20 0.38
NFKB1 P19838 2/20 0.37
CDK4 P11802 1/20 0.37
CCND1 P24385 1/20 0.37
SIRT2 Q8IXJ6 1/20 0.37
JUN P05412 1/20 0.37
NFE2L2 Q16236 1/20 0.37
ACHE P22303 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Catechol SCHEMBL6545013 0.86 MAPT (0.48) CA2CA12KDM4EHPGDTSHR
Salicyladehyde SCHEMBL3800873 0.85 TRIM24 (0.64) TRIM24TRIM33CA2CA12KDM4E
SCHEMBL20076 0.83
SCHEMBL29511549 0.83
SCHEMBL5533760 0.81 TRPA1 (0.68) CA2TRPA1NFKB1CDK4CCND1
SCHEMBL5533754 0.81 TRPA1 (0.68) CA2TRPA1NFKB1CDK4CCND1
Benzene SCHEMBL23581564 0.81 TRIM24 (0.54) TRIM24TRIM33CA2CA12KDM4E
SCHEMBL6122881 0.81 TRIM24 (0.54) TRIM24TRIM33CA2CA12KDM4E
Methane SCHEMBL2951846 0.81 TRIM24 (0.54) TRIM24TRIM33CA2CA12KDM4E
Fluoride SCHEMBL2197395 0.81 TRIM24 (0.54) TRIM24TRIM33CA2CA12KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116888539-A Pattern forming method and method for manufacturing electronic device 富士胶片株式会社 2023-10-13 CN disclosed
CN-115997167-A Actinic-ray-or radiation-sensitive resin composition, resist film, pattern forming method, method for producing electronic device, and compound 富士胶片株式会社 2023-04-21 CN disclosed
CN-115917431-A Actinic-ray-or radiation-sensitive resin composition, resist film, pattern formation method, and method for manufacturing electronic device 富士胶片株式会社 2023-04-04 CN disclosed
CN-115769146-A Actinic-ray-or radiation-sensitive resin composition, pattern formation method, resist film, method for producing electronic device, compound, and method for producing compound 富士胶片株式会社 2023-03-07 CN disclosed