Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 4/20 | 0.33 |
| ▸ | CA1 | P00915 | 3/20 | 0.33 |
| ▸ | MMP1 | P03956 | 2/20 | 0.33 |
| ▸ | MMP2 | P08253 | 2/20 | 0.33 |
| ▸ | MMP9 | P14780 | 2/20 | 0.33 |
| ▸ | MMP8 | P22894 | 2/20 | 0.33 |
| ▸ | MMP13 | P45452 | 2/20 | 0.33 |
| ▸ | BRD4 | O60885 | 3/20 | 0.33 |
| ▸ | CYTH2 | Q99418 | 1/20 | 0.33 |
| ▸ | F2 | P00734 | 3/20 | 0.31 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.31 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.31 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | CYP2B6 | P20813 | 1/20 | 0.31 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.31 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL31049548 | 0.83 | CA1 (0.38) | CA2CA1BRD4CYTH2CYP1A2 | |
| SCHEMBL2905597 | 0.78 | F2 (0.36) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL6743597 | 0.78 | CA2 (0.36) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL29670948 | 0.76 | CA2 (0.37) | CA2CA1MMP1MMP2MMP9 | |
| Benzenethiol SCHEMBL29745974 | 0.73 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| Methyl Alcohol SCHEMBL28728569 | 0.73 | CA2 (0.50) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL23932 | 0.73 | CA2 (0.54) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL30354089 | 0.73 | CA2 (0.54) | CA2CA1MMP1MMP2MMP9 | |
| Hydroquinone SCHEMBL575914 | 0.72 | CA2 (0.42) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL2482919 | 0.72 | RORA (0.40) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7314700-B2 | High sensitivity resist compositions for electron-based lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-01-01 | — | — | US | claimed |
| EP-1586005-B1 | HIGH SENSITIVITY RESIST COMPOSITIONS FOR ELECTRON-BASED LITHOGRAPHY | IBM (US) | 2010-08-11 | — | — | EP | disclosed |
| EP-1586005-A4 | HIGH SENSITIVITY RESIST COMPOSITIONS FOR ELECTRON-BASED LITHOGRAPHY | IBM (US) | 2009-05-13 | — | — | EP | disclosed |
| US-7314700-B2 | High sensitivity resist compositions for electron-based lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-01-01 | — | — | US | disclosed |
| US-20060127800-A1 | High sensitivity resist compositions for electron-based lithography | GLOBALFOUNDRIES U.S. INC. | 2006-06-15 | — | — | US | disclosed |
| EP-1586005-A2 | HIGH SENSITIVITY RESIST COMPOSITIONS FOR ELECTRON-BASED LITHOGRAPHY | International Business Machines Corporation (US) | 2005-10-19 | — | — | EP | disclosed |
| WO-2004053594-A2 | HIGH SENSITIVITY RESIST COMPOSITIONS FOR ELECTRON-BASED LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2004-06-24 | — | — | WO | disclosed |