SCHEMBL6743597

SCHEMBL6743597

Cc1ccc(S)cc1.O=S(=O)(O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CA2 P00918 11/20 0.36
CA1 P00915 9/20 0.36
CA5A P35218 1/20 0.36
CA9 Q16790 1/20 0.36
MMP1 P03956 2/20 0.35
MMP2 P08253 2/20 0.35
MMP9 P14780 2/20 0.35
MMP8 P22894 2/20 0.35
MMP13 P45452 2/20 0.35
GAA P10253 2/20 0.35
F2 P00734 4/20 0.33
PRSS1 P07477 4/20 0.33
PRSS2 P07478 4/20 0.33
PRSS3 P35030 4/20 0.33
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29670948 0.98 CA2 (0.37) CA2CA1CA5ACA9MMP1
SCHEMBL2482919 0.84 RORA (0.40) CA2CA1CA9MMP1MMP2
SCHEMBL3914557 0.83 CA2 (0.36) CA2CA1CA5ACA9MMP1
Benzenethiol SCHEMBL29745974 0.83 CA2 (0.39) CA2CA1MMP1MMP2MMP9
SCHEMBL4392561 0.83 HSD11B1 (0.41) CA2CA1CA9MMP1MMP2
Trifluoromethanesulfonic Acid SCHEMBL6248784 0.82 CA2 (0.42) CA2CA1CA5ACA9MMP1
SCHEMBL4399560 0.81 HSD11B1 (0.40) CA2CA1CA9MMP1MMP2
Trifluoromethanesulfonic Acid SCHEMBL1455936 0.80 CA2 (0.41) CA2CA1CA5ACA9MMP1
SCHEMBL29670941 0.79 CA2 (0.35) CA2CA1CA5ACA9MMP1
SCHEMBL2902138 0.78 CA2 (0.33) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6696216-B2 A PHOTO ACID GENERATOR USED IN GENERATING AN ACID FOR CHEMICALLY CLEAVING ACID SENSITIVE SIDE CHAINS OF A CHEMICALLY AMPLIFIED BASE POLYMER CONTAINS A SULFONIUM OR IODONIUM SALT CONTAINING ATLEAST ONE THIOPHENE RING INTERNATIONAL BUSINESS MACHINES CORPORATION 2004-02-24 US disclosed
US-20030008230-A1 Thiophene-containing photo acid generators for photolithography INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-01-09 US disclosed
WO-2003003120-A1 THIOPHENE-CONTAINING PHOTO ACID GENERATORS FOR PHOTOLITHOGRAPHY INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2003-01-09 WO disclosed