SCHEMBL2902322

SCHEMBL2902322

FC(C(F)(F)OC(F)(F)C(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8401587 1.00 LMNA (0.32) LMNA
SCHEMBL16418239 0.78 LMNA (0.38) LMNA
SCHEMBL3056072 0.78 LMNA (0.38) LMNA
SCHEMBL29760583 0.78
SCHEMBL8512464 0.76
SCHEMBL8672889 0.76 LMNA (0.36) LMNA
SCHEMBL3629754 0.76 LMNA (0.36) LMNA
SCHEMBL7773758 0.76 LMNA (0.36) LMNA
SCHEMBL1526904 0.76 LMNA (0.36) LMNA
SCHEMBL3626391 0.76 LMNA (0.36) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117461112-A Curable composition, film forming method, and method for producing product 佳能株式会社 2024-01-26 CN disclosed
WO-2023243484-A1 CURABLE COMPOSITION, METHOD FOR FORMING INVERTED PATTERN, METHOD FOR FORMING FILM, AND METHOD FOR PRODUCING ARTICLE キヤノン株式会社 2023-12-21 WO disclosed
CN-116635210-A Film forming method and article manufacturing method 佳能株式会社 2023-08-22 CN disclosed
WO-2023153123-A1 FILM FORMATION METHOD AND ARTICLE MANUFACTURING METHOD キヤノン株式会社 2023-08-17 WO disclosed
WO-2023140030-A1 PATTERN FORMATION METHOD AND ARTICLE PRODUCTION METHOD キヤノン株式会社 2023-07-27 WO disclosed
CN-109075032-B Pattern forming method, production method of processed substrate, production method of optical component, production method of circuit board, production method of electronic component, and production method of imprint mold 佳能株式会社 2023-05-16 CN disclosed
CN-109075031-B Pattern forming method, manufacturing method of processed substrate, manufacturing method of optical component, manufacturing method of circuit board, manufacturing method of electronic component, and manufacturing method of imprint mold 佳能株式会社 2023-05-16 CN disclosed
EP-2847233-A1 CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME Canon Kabushiki Kaisha (JP) 2015-03-18 EP disclosed
EP-2760894-A1 PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME Canon Kabushiki Kaisha (JP) 2014-08-06 EP disclosed
WO-2013183467-A1 CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME CANON KABUSHIKI KAISHA (JP) 2013-12-12 WO disclosed
WO-2013069511-A1 PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME CANON KABUSHIKI KAISHA (JP) 2013-05-16 WO disclosed
EP-2212374-A1 NOVEL COMPOUNDS FOR FABRIC TREATMENT Unilever PLC (GB) 2010-08-04 EP disclosed
WO-2009065664-A1 NOVEL COMPOUNDS FOR FABRIC TREATMENT UNILEVER PLC (GB) 2009-05-28 WO disclosed
US-5760100-A OXYGEN AND ION OR WATER PERMEABILITY CIBA VISION CORPORATION (US) 1998-06-02 US disclosed