SCHEMBL29031922

SCHEMBL29031922

O=c1c2ccccc2oc2cccc(Oc3ccccc3)c12

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAOA P21397 9/20 0.67
▸ NPC1 O15118 4/20 0.59
▸ RAB9A P51151 3/20 0.59
▸ POLB P06746 1/20 0.59
▸ L3MBTL1 Q9Y468 1/20 0.59
▸ KDM4E B2RXH2 2/20 0.53
▸ ALDH1A1 P00352 2/20 0.53
▸ SMN1; SMN2 Q16637 2/20 0.53
▸ GLA P06280 1/20 0.53
▸ CYP3A4 P08684 1/20 0.53
▸ MAPT P10636 1/20 0.53
▸ HPGD P15428 1/20 0.53
▸ PGAM1 P18669 1/20 0.53
▸ CASP1 P29466 1/20 0.53
▸ CASP7 P55210 1/20 0.53
▸ HSD17B10 Q99714 1/20 0.53
▸ LMNA P02545 2/20 0.49
▸ KDM5A P29375 2/20 0.47
▸ ESR1 P03372 1/20 0.47
▸ ESR2 Q92731 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21874395 0.90 MAOA (0.75) MAOANPC1RAB9APOLBL3MBTL1
SCHEMBL3763290 0.83 MAOA (0.71) MAOANPC1RAB9AKDM4EALDH1A1
SCHEMBL5170454 0.81 NPC1 (0.44) MAOANPC1RAB9APOLBL3MBTL1
SCHEMBL640746 0.80 MAOA (1.00) MAOANPC1RAB9APOLBKDM4E
SCHEMBL9127627 0.80 NPC1 (0.48) MAOANPC1RAB9APOLBL3MBTL1
SCHEMBL3837760 0.77 MAOA (0.67) MAOANPC1RAB9AKDM4EALDH1A1
SCHEMBL4914778 0.77 MAOA (0.61) MAOANPC1RAB9APOLBL3MBTL1
SCHEMBL6893811 0.76 MAOA (0.69) MAOANPC1RAB9AKDM4EALDH1A1
SCHEMBL5842359 0.76 MAOA (0.60) MAOANPC1RAB9AKDM4EALDH1A1
SCHEMBL6859087 0.76 MAOA (0.60) MAOAPOLBL3MBTL1KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117420731-A Negative photosensitive composition and pattern forming method 东京应化工业株式会社 2024-01-19 — — CN disclosed
CN-116018558-A Negative photosensitive resin composition, pattern forming method and laminated film 三亚普罗股份有限公司 2023-04-25 — — CN disclosed
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