SCHEMBL29039541

SCHEMBL29039541

CCCCCCc1ccc(Oc2cccc3cc4ccccc4cc23)cc1

nearest known ligand 0.54

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ ICAM1 P05362 1/20 0.43
▸ SELE P16581 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29039548 1.00 ICAM1 (0.43) ICAM1SELE
SCHEMBL29039554 0.99 ICAM1 (0.42) ICAM1SELE
SCHEMBL29039547 0.94 CARM1 (0.40) —
SCHEMBL29039551 0.89 ALDH1A1 (0.42) —
SCHEMBL26631493 0.83 CARM1 (0.50) —
SCHEMBL29039553 0.83 CYP1A2 (0.46) ICAM1SELE
SCHEMBL29039549 0.81 TRPV1 (0.47) —
Anthracene SCHEMBL28891105 0.81 ESR1 (0.59) —
SCHEMBL3464859 0.79 GAA (0.46) —
SCHEMBL21858151 0.79 ESR1 (0.46) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116300313-A Photosensitive resin composition, dry film resist, photosensitive dry film and application thereof 杭州福斯特电子材料有限公司 2023-06-23 — — CN claimed
CN-116300313-A Photosensitive resin composition, dry film resist, photosensitive dry film and application thereof 杭州福斯特电子材料有限公司 2023-06-23 — — CN disclosed
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