SCHEMBL29039551

SCHEMBL29039551

CCCc1ccc(Oc2cccc3cc4ccccc4cc23)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.42
▸ RAB9A P51151 1/20 0.42
▸ CARM1 Q86X55 1/20 0.41
▸ PRMT6 Q96LA8 1/20 0.41
▸ MAPK1 P28482 2/20 0.39
▸ HTT P42858 2/20 0.39
▸ MEN1 O00255 1/20 0.39
▸ USP2 O75604 1/20 0.39
▸ LMNA P02545 1/20 0.39
▸ GAA P10253 1/20 0.39
▸ MAPT P10636 1/20 0.39
▸ ALOX15 P16050 1/20 0.39
▸ XBP1 P17861 1/20 0.39
▸ ALOX12 P18054 1/20 0.39
▸ KMT2A Q03164 1/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39
▸ HSD17B10 Q99714 1/20 0.39
▸ F2 P00734 1/20 0.38
▸ FDFT1 P37268 1/20 0.38
▸ POLB P06746 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29039547 0.91 CARM1 (0.40) CARM1PRMT6
SCHEMBL29039554 0.90 ICAM1 (0.42) —
SCHEMBL29039541 0.89 ICAM1 (0.43) —
SCHEMBL29039548 0.89 ICAM1 (0.43) —
SCHEMBL29039553 0.88 CYP1A2 (0.46) ALDH1A1RAB9ACARM1PRMT6MAPK1
SCHEMBL3464859 0.83 GAA (0.46) ALDH1A1CARM1PRMT6MAPK1HTT
SCHEMBL28096380 0.81 LTA4H (0.53) RAB9AMAPK1MEN1LMNAGAA
SCHEMBL26631493 0.79 CARM1 (0.50) CARM1PRMT6HTTMEN1LMNA
SCHEMBL445495 0.78 CTNNB1 (0.44) ALDH1A1MEN1LMNAGAAMAPT
SCHEMBL28489683 0.78 HTR2A (0.45) ALDH1A1RAB9ACARM1PRMT6MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116300313-A Photosensitive resin composition, dry film resist, photosensitive dry film and application thereof 杭州福斯特电子材料有限公司 2023-06-23 — — CN claimed
CN-116300313-A Photosensitive resin composition, dry film resist, photosensitive dry film and application thereof 杭州福斯特电子材料有限公司 2023-06-23 — — CN disclosed
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