SCHEMBL2904034

SCHEMBL2904034

O=C1c2ccccc2C(=O)N1OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 7/20 0.48
MEN1 O00255 4/20 0.48
KDM4E B2RXH2 9/20 0.47
MAPT P10636 8/20 0.47
ALDH1A1 P00352 8/20 0.47
HPGD P15428 6/20 0.47
VDR P11473 3/20 0.44
F2 P00734 4/20 0.41
HTT P42858 3/20 0.41
XBP1 P17861 2/20 0.41
LMNA P02545 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2C19 P33261 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
CA1 P00915 5/20 0.39
CA2 P00918 5/20 0.39
THRB P10828 1/20 0.36
GAA P10253 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1470558 0.98 KMT2A (0.49) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL29366293 0.98 KMT2A (0.49) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL20679637 0.88 ALDH1A1 (0.52) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL4831815 0.87 KMT2A (0.47) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL1419593 0.86 ALDH1A1 (0.53) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL2894844 0.84 CA1 (0.37) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL3822690 0.84 TDP1 (0.38) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL3829063 0.83 CA1 (0.34) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL2895599 0.82 PIK3CD (0.36) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL1419545 0.82 DNMT1 (0.37) KMT2AMEN1KDM4EMAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4405094-A1 HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST 10X Genomics, Inc. (US) 2024-07-31 EP disclosed
US-20240076656-A1 HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST 10X GENOMICS, INC. (US) 2024-03-07 US disclosed
WO-2024006798-A1 HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST 10X GENOMICS, INC. (US) 2024-01-04 WO disclosed
WO-2024006827-A1 METHODS AND SYSTEMS FOR LIGHT-CONTROLLED SURFACE PATTERNING USING PHOTOMASKS 10X GENOMICS, INC. (US) 2024-01-04 WO disclosed
WO-2024006799-A1 COVALENT ATTACHMENT OF SPLINT OLIGONUCLEOTIDES FOR MOLECULAR ARRAY GENERATION USING LIGATION 10X GENOMICS, INC. (US) 2024-01-04 WO disclosed
EP-4271511-A1 MOLECULAR ARRAY GENERATION USING PHOTORESIST 10X Genomics, Inc. (US) 2023-11-08 EP disclosed
CN-108885396-B Positive working photosensitive material 默克专利有限公司 2023-03-24 CN disclosed
WO-2022147140-A1 MOLECULAR ARRAY GENERATION USING PHOTORESIST 10X GENOMICS, INC. (US) 2022-07-07 WO disclosed
CN-114651212-A Positive photosensitive material 默克专利股份有限公司 2022-06-21 CN disclosed
CN-110032042-B Negative photoresist composition for laser ablation and method of use thereof 默克专利有限公司 2022-05-27 CN disclosed
US-6506537-B2 Photopolymerization JSR CORPORATION (JP) 2003-01-14 US disclosed
US-20020192593-A1 Used as chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure JSR CORPORATION (JP) 2002-12-19 US disclosed
US-20020172885-A1 Novel carbazole derivative and chemically amplified radiation-sensitive resin composition JSR CORPORATION (JP) 2002-11-21 US disclosed
EP-1253470-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-10-30 EP disclosed
EP-1238972-A1 Novel carbazole derivative and chemically amplified radiation-sensitive resin composition JSR Corporation (JP) 2002-09-11 EP disclosed
EP-1231205-A1 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2002-08-14 EP disclosed
US-20020012872-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-31 US disclosed
EP-1164433-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020172885-A1 Novel carbazole derivative and chemically amplified radiation-sensitive resin composition ARID2, RAD1, RAD51 KMT2A 443/4885MEN1 2881/4885KDM4E 3279/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.