SCHEMBL29366293

SCHEMBL29366293

O=C1c2ccccc2C(=O)N1OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 7/20 0.49
MEN1 O00255 4/20 0.49
KDM4E B2RXH2 9/20 0.49
MAPT P10636 8/20 0.49
ALDH1A1 P00352 8/20 0.49
HPGD P15428 6/20 0.49
VDR P11473 3/20 0.45
F2 P00734 4/20 0.42
HTT P42858 3/20 0.42
XBP1 P17861 2/20 0.42
LMNA P02545 2/20 0.42
CYP1A2 P05177 1/20 0.42
CYP3A4 P08684 1/20 0.42
CYP2C19 P33261 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
CA1 P00915 5/20 0.38
CA2 P00918 5/20 0.38
THRB P10828 1/20 0.37
GAA P10253 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1470558 1.00 KMT2A (0.49) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL2904034 0.98 KMT2A (0.48) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL1419593 0.87 ALDH1A1 (0.53) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL20679637 0.86 ALDH1A1 (0.52) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL4831815 0.85 KMT2A (0.47) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL2895599 0.84 PIK3CD (0.36) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL3829099 0.83 TDP1 (0.39) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL24943440 0.82 ALDH1A1 (0.55) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL2894844 0.82 CA1 (0.37) KMT2AMEN1KDM4EMAPTALDH1A1
SCHEMBL3827287 0.82 KMT2A (0.33) KMT2AMEN1KDM4EMAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122043858-A EUV patterned resist formation method 亚历克斯·P·G·罗宾逊 2026-05-15 CN disclosed
CN-113994256-A Method for forming EUV patterned resist 亚历克斯·P·G·罗宾逊 2022-01-28 CN disclosed