Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PIK3CD | O00329 | 1/20 | 0.36 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.36 |
| ▸ | PIK3CB | P42338 | 1/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 13/20 | 0.36 |
| ▸ | CA2 | P00918 | 13/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | MMP1 | P03956 | 3/20 | 0.34 |
| ▸ | MMP2 | P08253 | 3/20 | 0.34 |
| ▸ | MMP9 | P14780 | 3/20 | 0.34 |
| ▸ | MMP8 | P22894 | 3/20 | 0.34 |
| ▸ | MMP13 | P45452 | 3/20 | 0.34 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | PARL | Q9H300 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2894844 | 0.99 | CA1 (0.37) | PIK3CDPIK3CAPIK3CBPTGS2CA1 | |
| SCHEMBL382979 | 0.85 | PTGS2 (0.41) | PTGS2KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL29366293 | 0.84 | KMT2A (0.49) | CA1CA2KMT2AKDM4EALDH1A1 | |
| SCHEMBL1470558 | 0.84 | KMT2A (0.49) | CA1CA2KMT2AKDM4EALDH1A1 | |
| SCHEMBL13098336 | 0.83 | PTGS2 (0.35) | PTGS2KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL2904034 | 0.82 | KMT2A (0.48) | CA1CA2KMT2AKDM4EALDH1A1 | |
| SCHEMBL1419593 | 0.75 | ALDH1A1 (0.53) | CA1CA2KMT2AKDM4EALDH1A1 | |
| SCHEMBL12039818 | 0.75 | VDR (0.47) | PTGS2KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL28737210 | 0.75 | PTGS2 (0.39) | PTGS2KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL20679637 | 0.74 | ALDH1A1 (0.52) | CA1CA2KMT2AKDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122043858-A | EUV patterned resist formation method | 亚历克斯·P·G·罗宾逊 | 2026-05-15 | — | — | CN | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |
| US-20200272050-A1 | Enhanced EUV Photoresist Materials, Formulations and Processes | IRRESISTIBLE MATERIALS, LTD (GB) | 2020-08-27 | — | — | US | disclosed |
| CN-110998437-A | Multi-trigger photoresist compositions and methods | A·P·G·罗宾森 | 2020-04-10 | — | — | CN | disclosed |
| US-10095112-B2 | Multiple trigger photoresist compositions and methods | IRRESISTIBLE MATERIALS LTD (GB) | 2018-10-09 | — | — | US | disclosed |
| US-20180246408-A1 | MULTIPLE TRIGGER PHOTORESIST COMPOSITIONS AND METHODS | IRRESISTIBLE MATERIALS, LTD (GB) | 2018-08-30 | — | — | US | disclosed |
| US-9519215-B2 | Composition of matter and molecular resist made therefrom | IRRESISTIBLE MATERIALS, LTD (GB) | 2016-12-13 | — | — | US | disclosed |
| US-9448474-B2 | Positive photosensitive resin composition and pattern forming method | CHI MEI CORPORATION (TW) | 2016-09-20 | — | — | US | disclosed |
| US-20160246173-A1 | Composition of Matter and Molecular Resist Made Therefrom | IRRESISTIBLE MATERIALS LTD (GB) | 2016-08-25 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-6337171-B1 | AS A RESIST APPLICABLE TO FAR ULTRAVIOLET RAYS SUCH AS A KRF EXCIMER LASER, CHARGED PARTICLE RAYS SUCH AS ELECTRON BEAMS, AND X-RAYS | JSR CORPORATION (JP) | 2002-01-08 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-6136500-A | CONTAINS A PHOTOACID GENERATOR COMPRISING A COMBINATION OF A COMPOUND THAT GENERATES A CARBOXYLIC ACID UPON EXPOSURE TO RADIATION AND ANOTHER COMPOUND THAT GENERATES ANOTHER ACID UPON EXPOSURE TO RADIATION | JSR CORPORATION (JP) | 2000-10-24 | — | — | US | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10095112-B2 | Multiple trigger photoresist compositions and methods | ERCC4, ERCC2, APEX1 | PIK3CD 3317/4885PIK3CA 2720/4885PIK3CB 2561/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.