Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 14/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 13/20 | 0.42 |
| ▸ | RAB9A | P51151 | 3/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.41 |
| ▸ | MEN1 | O00255 | 4/20 | 0.41 |
| ▸ | LMNA | P02545 | 4/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | CRHBP | P24387 | 1/20 | 0.41 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.41 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.40 |
| ▸ | GAA | P10253 | 5/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.40 |
| ▸ | HTT | P42858 | 3/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | BLM | P54132 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29406852 | 1.00 | MAPT (0.42) | MAPTALDH1A1RAB9AKDM4EMEN1 | |
| Hydrochloric Acid SCHEMBL11220426 | 0.99 | MAPT (0.41) | MAPTALDH1A1RAB9AKDM4EMEN1 | |
| SCHEMBL29606616 | 0.91 | KCNH2 (0.40) | MAPTALDH1A1RAB9AKDM4EMEN1 | |
| SCHEMBL2266611 | 0.91 | KCNH2 (0.40) | MAPTALDH1A1RAB9AKDM4EMEN1 | |
| SCHEMBL28222325 | 0.83 | ALDH1A1 (0.33) | MAPTALDH1A1RAB9AKDM4EMEN1 | |
| SCHEMBL30496909 | 0.83 | HIF1A (0.37) | MAPTALDH1A1RAB9AKDM4EMEN1 | |
| SCHEMBL27822003 | 0.83 | MAPT (0.41) | MAPTALDH1A1RAB9AKDM4EMEN1 | |
| SCHEMBL29203833 | 0.82 | MAPT (0.45) | MAPTALDH1A1RAB9AKDM4EMEN1 | |
| SCHEMBL374911 | 0.82 | MAPT (0.53) | MAPTALDH1A1RAB9AKDM4EMEN1 | |
| SCHEMBL29740108 | 0.82 | MAPT (0.53) | MAPTALDH1A1RAB9AKDM4EMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 393 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117186403-B | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-117430812-B | Photosensitive polyamic acid ester resin, resin composition and application | 明士(北京)新材料开发有限公司 | 2024-03-19 | — | — | CN | claimed |
| CN-117701233-A | Photosensitive polyimide glue solution suitable for coating and coating method thereof | 明士(北京)新材料开发有限公司 | 2024-03-15 | — | — | CN | claimed |
| CN-117210141-B | Development-resistant photosensitive adhesive film and preparation and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-26 | — | — | CN | claimed |
| CN-117430812-A | Photosensitive polyamic acid ester resin, resin composition and application | 明士(北京)新材料开发有限公司 | 2024-01-23 | — | — | CN | claimed |
| CN-117384378-A | Photosensitive polyamic acid ester resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-12 | — | — | CN | claimed |
| CN-117331279-A | Photosensitive resin composition, film material, epoxy compound containing benzocyclobutene structure and application thereof | 华为技术有限公司 | 2024-01-02 | — | — | CN | claimed |
| CN-116836388-B | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-15 | — | — | CN | claimed |
| CN-117210141-A | Development-resistant photosensitive adhesive film and preparation and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-12 | — | — | CN | claimed |
| CN-117186403-A | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-08 | — | — | CN | claimed |
| CN-114995060-B | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-115236938-A | Negative photosensitive polyamic acid ester resin composition and use thereof | 明士(北京)新材料开发有限公司 | 2022-10-25 | — | — | CN | claimed |
| CN-115160569-A | Photosensitive polyamic acid ester resin, resin composition and electronic component | 明士(北京)新材料开发有限公司 | 2022-10-11 | — | — | CN | claimed |
| CN-114995060-A | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-114488690-A | Chemical amplification type negative polyimide photoresist and preparation method and application thereof | 中国科学院化学研究所 | 2022-05-13 | — | — | CN | claimed |
| CN-114280887-A | Negative photosensitive solid glue film developed by alkaline water system and preparation method thereof | 明士(北京)新材料开发有限公司 | 2022-04-05 | — | — | CN | claimed |
| CN-111522200-B | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2021-07-27 | — | — | CN | claimed |
| CN-111522200-A | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2020-08-11 | — | — | CN | claimed |
| CN-110028670-A | Low-dielectric loss negative light-sensitive poly amic acid ester resin, resin combination, preparation method and application | 明士新材料有限公司 | 2019-07-19 | — | — | CN | claimed |
| US-6969613-B1 | Method for determination of hydrogen sulfide or sulfide ion and method for determination of specific substance utilizing said method | DAIICHI PURE CHEMICALS CO., LTD. (JP) | 2005-11-29 | — | — | US | claimed |