Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.41 |
| ▸ | AHR | P35869 | 2/20 | 0.35 |
| ▸ | BACE1 | P56817 | 1/20 | 0.33 |
| ▸ | CA3 | P07451 | 1/20 | 0.31 |
| ▸ | CA6 | P23280 | 1/20 | 0.31 |
| ▸ | CA5A | P35218 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.31 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16737102 | 0.84 | CYP1A2 (0.44) | CYP1A2CYP2A6AHRBACE1CA3 | |
| SCHEMBL18207643 | 0.74 | CYP1A2 (0.35) | CYP1A2CYP2A6AHR | |
| SCHEMBL229949 | 0.73 | CYP2A6 (0.37) | CYP1A2CYP2A6ALDH1A1 | |
| SCHEMBL4838237 | 0.71 | CYP2A6 (0.41) | CYP1A2CYP2A6CA9ALDH1A1 | |
| SCHEMBL21385087 | 0.71 | CYP1A2 (0.52) | CYP1A2CYP2A6AHRBACE1ALDH1A1 | |
| SCHEMBL4840796 | 0.71 | CYP2A6 (0.41) | CYP1A2CYP2A6CA9ALDH1A1 | |
| SCHEMBL29045293 | 0.68 | — | — | |
| SCHEMBL644839 | 0.68 | CYP1A2 (0.48) | CYP1A2CYP2A6AHRBACE1ALDH1A1 | |
| SCHEMBL5658747 | 0.67 | CYP1A2 (0.42) | CYP1A2CYP2A6 | |
| SCHEMBL209074 | 0.67 | BACE1 (0.38) | CYP1A2CYP2A6AHRBACE1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117940850-A | Composition for forming silicon-containing resist underlayer film, laminate using same, and method for producing semiconductor element | 日产化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-117396811-A | Composition for forming underlayer film of silicon-containing resist | 日产化学株式会社 | 2024-01-12 | — | — | CN | disclosed |
| CN-117396810-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2024-01-12 | — | — | CN | disclosed |
| CN-117083570-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-117063129-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2023-11-14 | — | — | CN | disclosed |
| CN-116547781-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |
| CN-116547343-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |