⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1393170 | 0.70 | — | — | |
| SCHEMBL29045253 | 0.68 | CYP1A2 (0.41) | — | |
| SCHEMBL10418671 | 0.68 | HPRT1 (0.31) | — | |
| SCHEMBL5274737 | 0.67 | HPRT1 (0.38) | — | |
| SCHEMBL16737102 | 0.67 | CYP1A2 (0.44) | — | |
| SCHEMBL17514981 | 0.64 | — | — | |
| SCHEMBL20356023 | 0.64 | GPR84 (0.41) | — | |
| SCHEMBL1392699 | 0.63 | — | — | |
| SCHEMBL17514864 | 0.61 | HTR5A (0.31) | — | |
| SCHEMBL17514762 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117940850-A | Composition for forming silicon-containing resist underlayer film, laminate using same, and method for producing semiconductor element | 日产化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-117396811-A | Composition for forming underlayer film of silicon-containing resist | 日产化学株式会社 | 2024-01-12 | — | — | CN | disclosed |
| CN-117396810-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2024-01-12 | — | — | CN | disclosed |
| CN-117083570-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-117063129-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2023-11-14 | — | — | CN | disclosed |
| CN-116547781-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |
| CN-116547343-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |