SCHEMBL29045308

SCHEMBL29045308

COC(Cc1ccccc1)[Si](Cl)(Cl)Cl.COC(Cc1ccccc1)[Si](OC(C)=O)(OC(C)=O)OC(C)=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CTRB1 P17538 5/20 0.39
ALDH1A1 P00352 1/20 0.38
ALPI P09923 1/20 0.38
PKM P14618 1/20 0.38
PTGS1 P23219 1/20 0.38
XIAP P98170 1/20 0.38
SLC7A5 Q01650 1/20 0.38
MTNR1A P48039 2/20 0.38
MTNR1B P49286 2/20 0.38
SLC15A1 P46059 1/20 0.37
PPARG P37231 2/20 0.37
PPARA Q07869 2/20 0.37
CYP1A2 P05177 1/20 0.37
SRR Q9GZT4 1/20 0.36
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
LTA4H P09960 1/20 0.35
LAP3 P28838 1/20 0.35
MEN1 O00255 1/20 0.35
POLB P06746 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1973015 0.93 ALDH1A1 (0.43) CTRB1ALDH1A1ALPIPKMPTGS1
SCHEMBL1970396 0.83 TAAR1 (0.42) CTRB1PPARGPPARALAP3
SCHEMBL1968084 0.73 TAAR1 (0.42) PPARGPPARACYP1A2LAP3
SCHEMBL1972957 0.69 TAAR1 (0.38) LAP3
SCHEMBL8091095 0.65 SRR (0.58) ALPIPKMPTGS1XIAPSLC7A5
SCHEMBL12141661 0.65 SRR (0.58) ALPIPKMPTGS1XIAPSLC7A5
Bicarbonate SCHEMBL27963030 0.65 NPC1 (0.53) ALDH1A1ALPIPKMPTGS1XIAP
SCHEMBL7055125 0.65 ALDH1A1 (0.44) ALDH1A1PTGS1MTNR1AMTNR1BMAPT
SCHEMBL31553563 0.65 ALDH1A1 (0.53) CTRB1ALDH1A1ALPIPKMPTGS1
SCHEMBL9422867 0.64 ALDH1A1 (0.48) CTRB1ALDH1A1ALPIPKMPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117940850-A Composition for forming silicon-containing resist underlayer film, laminate using same, and method for producing semiconductor element 日产化学株式会社 2024-04-26 CN disclosed
CN-117063129-A Composition for forming silicon-containing underlayer film for directional self-assembly 日产化学株式会社 2023-11-14 CN disclosed
CN-116547781-A Composition for forming resist underlayer film 日产化学株式会社 2023-08-04 CN disclosed