SCHEMBL29045688

SCHEMBL29045688

CCN(CC)c1ccc(CC2CCCCC2=O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 6/20 0.50
PTGS2 P35354 6/20 0.50
KMT2A Q03164 3/20 0.50
OPRK1 P41145 1/20 0.50
HTT P42858 1/20 0.50
ALDH1A1 P00352 3/20 0.48
MEN1 O00255 2/20 0.48
GAA P10253 1/20 0.48
MAPT P10636 1/20 0.48
THRB P10828 1/20 0.48
RECQL P46063 1/20 0.48
HSD17B10 Q99714 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
RAB9A P51151 2/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA4 P22748 1/20 0.44
CA6 P23280 1/20 0.44
NPC1 O15118 1/20 0.44
HPGD P15428 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11788709 0.98 PTGS1 (0.49) PTGS1PTGS2KMT2AOPRK1HTT
SCHEMBL28547422 0.97 PTGS2 (0.53) PTGS1PTGS2KMT2AOPRK1HTT
SCHEMBL9567330 0.84 ALDH1A1 (0.50) KMT2AALDH1A1MEN1GAAMAPT
SCHEMBL5593665 0.84 PTGS1 (0.52) PTGS1PTGS2KMT2AOPRK1HTT
SCHEMBL11794375 0.83 PTGS1 (0.51) PTGS1PTGS2KMT2AOPRK1HTT
SCHEMBL28794475 0.81 ALDH1A1 (0.45) PTGS1PTGS2KMT2AOPRK1HTT
SCHEMBL14489571 0.81 ALDH1A1 (0.53) KMT2AALDH1A1MEN1GAAMAPT
SCHEMBL29169532 0.79 NPC1 (0.57) PTGS1PTGS2KMT2AOPRK1HTT
SCHEMBL7623394 0.79 NPC1 (0.57) PTGS1PTGS2KMT2AOPRK1HTT
SCHEMBL29169517 0.79 PTGS2 (0.60) PTGS1PTGS2KMT2AOPRK1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116520639-A Photosensitive polyimide resin and composition and preparation method thereof 明士(北京)新材料开发有限公司 2023-08-01 CN claimed
CN-116520639-A Photosensitive polyimide resin and composition and preparation method thereof 明士(北京)新材料开发有限公司 2023-08-01 CN disclosed