Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
| ▸ | GAA | P10253 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | CRHBP | P24387 | 1/20 | 0.46 |
| ▸ | NPBWR1 | P48145 | 1/20 | 0.46 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.46 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.46 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.45 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.45 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.45 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propionic Acid SCHEMBL29049218 | 0.90 | HSD17B10 (0.54) | POLBHSD17B10TP53GAAMAPT | |
| Stearic Acid SCHEMBL10430552 | 0.90 | EPHX2 (0.52) | POLBHSD17B10TP53GAAMAPT | |
| Malonic Acid SCHEMBL29049213 | 0.88 | HSD17B10 (0.55) | POLBHSD17B10TP53GAAMAPT | |
| Bicarbonate SCHEMBL29049243 | 0.88 | HSD17B10 (0.58) | POLBHSD17B10TP53GAAMAPT | |
| Oxalic Acid SCHEMBL29049203 | 0.87 | HSD17B10 (0.56) | POLBHSD17B10TP53GAAMAPT | |
| Acetic Acid SCHEMBL29049224 | 0.87 | HSD17B10 (0.56) | POLBHSD17B10TP53GAAMAPT | |
| Chloroacetic Acid SCHEMBL29049239 | 0.86 | HSD17B10 (0.52) | POLBHSD17B10TP53GAAMAPT | |
| SCHEMBL2232108 | 0.85 | HSD17B10 (0.60) | POLBHSD17B10TP53GAAMAPT | |
| Hydrochloric Acid SCHEMBL4373569 | 0.83 | HSD17B10 (0.58) | POLBHSD17B10TP53GAAMAPT | |
| Water SCHEMBL29049225 | 0.83 | HSD17B10 (0.58) | POLBHSD17B10TP53GAAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112286000-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-12-03 | — | — | CN | disclosed |
| CN-111856882-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| CN-116804825-A | Composition for forming silicon-containing metal hard mask and pattern forming method | 信越化学工业株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |