SCHEMBL29078034

SCHEMBL29078034

COC1=Cc2ccccc2C2(O)SC12O

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PDK2 Q15119 1/20 0.33
SIGMAR1 Q99720 1/20 0.32
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29078053 0.77 PDK2 (0.31) PDK2
SCHEMBL9016932 0.66 KDM4E (0.31)
SCHEMBL29078038 0.59 KDM4E (0.34)
SCHEMBL14410910 0.59 ESR1 (0.36) PDK2
SCHEMBL30040937 0.58 ESR1 (0.38) PDK2
SCHEMBL7941719 0.58 PDK2 (0.33) PDK2
SCHEMBL4608440 0.58 ESR1 (0.38) PDK2
SCHEMBL28781240 0.57 SIGMAR1 (0.38) PDK2SIGMAR1KMT2A
SCHEMBL27284555 0.57 ALDH1A1 (0.32)
SCHEMBL3133043 0.56 MAPT (0.32) PDK2KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112513737-B Underlayer film forming composition 三菱瓦斯化学株式会社 2024-11-15 CN disclosed
CN-111655662-B Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method 三菱瓦斯化学株式会社 2023-09-26 CN disclosed