SCHEMBL29078053

SCHEMBL29078053

CC1=Cc2ccccc2C2(O)SC12O

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PDK2 Q15119 1/20 0.31
KDM4E B2RXH2 1/20 0.30
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29078034 0.77 PDK2 (0.33) PDK2
SCHEMBL7941719 0.74 PDK2 (0.33) PDK2KDM4EPKM
SCHEMBL2047468 0.69 PDK2 (0.34) PDK2
SCHEMBL28815299 0.67 PDK2 (0.33) PDK2
Ammonia Solution, Strong SCHEMBL7083566 0.67 PDK2 (0.33) PDK2
SCHEMBL3697332 0.67 LMNA (0.38)
SCHEMBL1675908 0.65 HTR2A (0.31)
SCHEMBL19981021 0.65 LMNA (0.31)
SCHEMBL22616659 0.65 LMNA (0.31)
SCHEMBL4652584 0.65 LMNA (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112513737-B Underlayer film forming composition 三菱瓦斯化学株式会社 2024-11-15 CN disclosed
CN-111655662-B Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method 三菱瓦斯化学株式会社 2023-09-26 CN disclosed