SCHEMBL29131693

SCHEMBL29131693

COc1ccc(N2N=C(c3ccc(C(C)C)cc3)CC2c2ccc(C(C)C)cc2)cc1

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 2/20 0.69
▸ KMT2A Q03164 2/20 0.69
▸ KDM4E B2RXH2 2/20 0.69
▸ ALDH1A1 P00352 2/20 0.69
▸ MAPT P10636 2/20 0.69
▸ LMNA P02545 1/20 0.69
▸ EGFR P00533 1/20 0.64
▸ ERBB2 P04626 1/20 0.64
▸ L3MBTL1 Q9Y468 6/20 0.63
▸ PDE5A O76074 5/20 0.62
▸ USP2 O75604 1/20 0.61
▸ TDP1 Q9NUW8 1/20 0.61
▸ PTGS2 P35354 2/20 0.61
▸ NR3C2 P08235 1/20 0.61
▸ CA12 O43570 1/20 0.60
▸ CA9 Q16790 1/20 0.60
▸ ATM Q13315 3/20 0.60
▸ RAB9A P51151 1/20 0.60
▸ GLA P06280 2/20 0.59
▸ POLB P06746 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15377485 0.94 EGFR (0.73) MEN1KMT2AKDM4EALDH1A1MAPT
SCHEMBL15377475 0.94 EGFR (0.73) MEN1KMT2AKDM4EALDH1A1MAPT
SCHEMBL18040117 0.91 PRKCZ (0.62) MEN1KMT2AKDM4EALDH1A1MAPT
SCHEMBL11123578 0.87 KDM4E (0.88) MEN1KMT2AKDM4EALDH1A1MAPT
SCHEMBL11126048 0.85 PDE5A (0.83) MEN1KMT2AKDM4EALDH1A1MAPT
SCHEMBL11122272 0.85 PDE5A (0.83) MEN1KMT2AKDM4EALDH1A1MAPT
SCHEMBL15301347 0.84 MEN1 (0.82) MEN1KMT2AKDM4EALDH1A1MAPT
SCHEMBL15301362 0.84 MEN1 (0.60) MEN1KMT2AKDM4EALDH1A1MAPT
SCHEMBL15301033 0.84 EGFR (0.62) MEN1KMT2AKDM4EALDH1A1MAPT
SCHEMBL10362296 0.84 EGFR (0.81) MEN1KMT2AKDM4EALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118043365-A Polymer, photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for forming wiring pattern 株式会社力森诺科 2024-05-14 — — CN disclosed
CN-117083568-A Photosensitive element and method for manufacturing photosensitive element 株式会社力森诺科 2023-11-17 — — CN disclosed
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