Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGFR | P00533 | 8/20 | 0.62 |
| ▸ | ERBB2 | P04626 | 7/20 | 0.62 |
| ▸ | ERBB3 | P21860 | 2/20 | 0.62 |
| ▸ | KDR | P35968 | 2/20 | 0.62 |
| ▸ | PTK2 | Q05397 | 2/20 | 0.62 |
| ▸ | MEN1 | O00255 | 5/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.61 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.61 |
| ▸ | GAA | P10253 | 1/20 | 0.61 |
| ▸ | ATM | Q13315 | 4/20 | 0.58 |
| ▸ | PRKCZ | Q05513 | 3/20 | 0.57 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.57 |
| ▸ | LMNA | P02545 | 1/20 | 0.57 |
| ▸ | MAPT | P10636 | 1/20 | 0.57 |
| ▸ | NR3C2 | P08235 | 1/20 | 0.57 |
| ▸ | RAB9A | P51151 | 1/20 | 0.55 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15300830 | 0.97 | EGFR (0.65) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL15301281 | 0.97 | MEN1 (0.60) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL15301362 | 0.94 | MEN1 (0.60) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL15301173 | 0.94 | PRKCZ (0.64) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL23052047 | 0.94 | EGFR (0.69) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL23052315 | 0.94 | EGFR (0.69) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL18040117 | 0.93 | PRKCZ (0.62) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL15301210 | 0.92 | MEN1 (0.64) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL2689592 | 0.92 | EGFR (0.54) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL15377485 | 0.92 | EGFR (0.73) | EGFRERBB2ERBB3KDRPTK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118355324-A | Photosensitive resin composition, photosensitive element, method for producing cured product pattern, and method for producing circuit board | 株式会社力森诺科 | 2024-07-16 | — | — | CN | disclosed |
| CN-118043365-A | Polymer, photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for forming wiring pattern | 株式会社力森诺科 | 2024-05-14 | — | — | CN | disclosed |
| CN-111492309-B | Photosensitive resin laminate | 旭化成株式会社 | 2023-12-12 | — | — | CN | disclosed |
| CN-117083568-A | Photosensitive element and method for manufacturing photosensitive element | 株式会社力森诺科 | 2023-11-17 | — | — | CN | disclosed |
| CN-109690404-B | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2023-04-04 | — | — | CN | disclosed |
| CN-110095937-B | Photosensitive resin laminate and method for producing resist pattern | 旭化成株式会社 | 2023-02-28 | — | — | CN | disclosed |
| US-9439291-B2 | Photosensitive element, method for forming resist pattern, and method for producing printed circuit board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-09-06 | — | — | US | disclosed |
| US-20130266900-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED CIRCUIT BOARD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-10-10 | — | — | US | disclosed |