Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCZ | Q05513 | 4/20 | 0.62 |
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | PKM | P14618 | 1/20 | 0.55 |
| ▸ | MEN1 | O00255 | 4/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.53 |
| ▸ | EGFR | P00533 | 5/20 | 0.52 |
| ▸ | ERBB2 | P04626 | 5/20 | 0.52 |
| ▸ | ERBB3 | P21860 | 2/20 | 0.52 |
| ▸ | KDR | P35968 | 2/20 | 0.52 |
| ▸ | PTK2 | Q05397 | 2/20 | 0.52 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.51 |
| ▸ | GAA | P10253 | 1/20 | 0.51 |
| ▸ | MAOB | P27338 | 1/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.50 |
| ▸ | CA9 | Q16790 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15301362 | 0.93 | MEN1 (0.60) | PRKCZLMNAMEN1KMT2AKDM4E | |
| SCHEMBL15301173 | 0.93 | PRKCZ (0.64) | PRKCZLMNAMEN1KMT2AKDM4E | |
| SCHEMBL15301033 | 0.93 | EGFR (0.62) | PRKCZLMNAMEN1KMT2AKDM4E | |
| SCHEMBL29131693 | 0.91 | MEN1 (0.69) | LMNAMEN1KMT2AKDM4EALDH1A1 | |
| SCHEMBL29216367 | 0.91 | PRKCZ (0.53) | PRKCZLMNAPKMMEN1KMT2A | |
| SCHEMBL29216369 | 0.91 | PRKCZ (0.53) | PRKCZLMNAPKMMEN1KMT2A | |
| SCHEMBL15301210 | 0.90 | MEN1 (0.64) | PRKCZLMNAMEN1KMT2AKDM4E | |
| SCHEMBL15300830 | 0.90 | EGFR (0.65) | PRKCZLMNAMEN1KMT2AKDM4E | |
| SCHEMBL15301281 | 0.90 | MEN1 (0.60) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL23052315 | 0.87 | EGFR (0.69) | PRKCZLMNAPKMMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025127002-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | 株式会社レゾナック | 2025-06-19 | — | — | WO | disclosed |
| WO-2025126273-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | 株式会社レゾナック | 2025-06-19 | — | — | WO | disclosed |
| WO-2025094282-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | 株式会社レゾナック | 2025-05-08 | — | — | WO | disclosed |
| WO-2025074828-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | 株式会社レゾナック | 2025-04-10 | — | — | WO | disclosed |
| CN-118043365-A | Polymer, photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for forming wiring pattern | 株式会社力森诺科 | 2024-05-14 | — | — | CN | disclosed |
| CN-117083568-A | Photosensitive element and method for manufacturing photosensitive element | 株式会社力森诺科 | 2023-11-17 | — | — | CN | disclosed |
| US-9439291-B2 | Photosensitive element, method for forming resist pattern, and method for producing printed circuit board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-09-06 | — | — | US | disclosed |