SCHEMBL29135575

SCHEMBL29135575

Nc1c(-c2ccccc2)cc(S(N)(=O)=O)c(-c2ccccc2)c1-c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IKBKB O14920 3/20 0.43
CHUK O15111 2/20 0.43
CA1 P00915 8/20 0.41
CA2 P00918 8/20 0.41
CA12 O43570 7/20 0.41
CA9 Q16790 7/20 0.41
CA7 P43166 3/20 0.41
CA4 P22748 3/20 0.41
CA6 P23280 3/20 0.41
CA5A P35218 2/20 0.41
CA14 Q9ULX7 2/20 0.41
CA5B Q9Y2D0 2/20 0.41
CYP2C9 P11712 1/20 0.41
APEX1 P27695 1/20 0.37
CYP2C19 P33261 1/20 0.37
PTGES2 Q9H7Z7 1/20 0.37
BACE1 P56817 1/20 0.36
CA3 P07451 1/20 0.36
PLA2G7 Q13093 1/20 0.36
CA13 Q8N1Q1 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8976123 0.77 CA2 (0.52) CA1CA2CA12CA9CA7
SCHEMBL21278695 0.75 HSD17B10 (0.44) IKBKBCHUKBACE1KDM4EALDH1A1
SCHEMBL530448 0.74 HSD17B10 (0.48) IKBKBCHUKBACE1KDM4EALDH1A1
Hydrochloric Acid SCHEMBL28480643 0.74 HSD17B10 (0.43) IKBKBCHUKBACE1KDM4EALDH1A1
SCHEMBL28135353 0.73 CA1 (0.39) CA1CA2CA12CA9CA7
SCHEMBL21617314 0.73 CA2 (0.50) CA1CA2CA12CA9CA7
SCHEMBL11676493 0.71 CA1 (0.48) IKBKBCHUKCA1CA2CA12
SCHEMBL8023017 0.71 NPC1 (0.46) IKBKBCHUKCA1CA2CA12
SCHEMBL30687380 0.71 NPC1 (0.46) IKBKBCHUKCA1CA2CA12
SCHEMBL48885 0.71 CA2 (0.52) CA1CA2CA12CA9CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117130224-A Positive photoresist composition for organic insulating film of liquid crystal display element 烟台希尔德材料科技有限公司 2023-11-28 CN claimed
CN-118584751-A POSS-based positive photoresist composition for organic insulating film 烟台希尔德材料科技有限公司 2024-09-03 CN disclosed
CN-117130224-A Positive photoresist composition for organic insulating film of liquid crystal display element 烟台希尔德材料科技有限公司 2023-11-28 CN disclosed