SCHEMBL2917616

SCHEMBL2917616

Cc1ccc(NC(=O)c2cc(C(=O)Nc3ccc(C)c(C)c3)cc(C(=O)Nc3ccc(C)c(C)c3)c2)cc1C

nearest known ligand 0.73

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ FKBP5 Q13451 1/20 0.73
▸ RAB9A P51151 10/20 0.72
▸ NPC1 O15118 9/20 0.72
▸ KMT2A Q03164 4/20 0.72
▸ POLB P06746 2/20 0.63
▸ MEN1 O00255 3/20 0.60
▸ CYP1A2 P05177 1/20 0.60
▸ SMN1; SMN2 Q16637 6/20 0.58
▸ TP53 P04637 3/20 0.58
▸ PKM P14618 2/20 0.58
▸ MAPT P10636 1/20 0.56
▸ MLLT1 Q03111 1/20 0.55
▸ KCNQ3 O43525 1/20 0.54
▸ KCNQ2 O43526 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL823156 0.90 RAB9A (0.75) FKBP5RAB9ANPC1KMT2APOLB
SCHEMBL28622654 0.87 RAB9A (0.93) FKBP5RAB9ANPC1KMT2APOLB
SCHEMBL16583885 0.85 RAB9A (0.79) FKBP5RAB9ANPC1KMT2APOLB
SCHEMBL16589408 0.85 RAB9A (0.73) FKBP5RAB9ANPC1KMT2APOLB
SCHEMBL25815389 0.84 NPC1 (0.72) FKBP5RAB9ANPC1KMT2AMEN1
SCHEMBL10760743 0.84 RAB9A (0.71) FKBP5RAB9ANPC1KMT2APOLB
SCHEMBL12764158 0.84 RAB9A (0.68) FKBP5RAB9ANPC1KMT2APOLB
SCHEMBL13400967 0.84 RAB9A (0.67) FKBP5RAB9ANPC1KMT2APOLB
SCHEMBL14350091 0.83 RAB9A (0.65) FKBP5RAB9ANPC1KMT2APOLB
SCHEMBL15006333 0.83 KCNK3 (0.76) FKBP5RAB9ANPC1KMT2APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2862883-B1 METHOD FOR PRODUCING NUCLEATOR MASTERBATCH ADEKA CORP (JP) 2019-09-25 — — EP disclosed
US-9732198-B2 Mono- and multi-layer blown films BASF SE (DE) 2017-08-15 — — US disclosed
US-20170081486-A1 Mono- and Multi-Layer Blown Films BASF SE (DE) 2017-03-23 — — US disclosed
US-20160136871-A1 Mono- and Multi-Layer Blown Films BASF SE (DE) 2016-05-19 — — US disclosed
US-9278487-B2 Mono-and multi-layer blown films BASF SE (DE) 2016-03-08 — — US disclosed
US-9243127-B2 Method for producing nucleator masterbatch ADEKA CORPORATION (JP) 2016-01-26 — — US disclosed
US-20150152248-A1 METHOD FOR PRODUCING NUCLEATOR MASTERBATCH ADEKA CORPORATION (JP) 2015-06-04 — — US disclosed
EP-2862883-A1 METHOD FOR PRODUCING NUCLEATOR MASTERBATCH Adeka Corporation (JP) 2015-04-22 — — EP disclosed
US-8492468-B2 Polypropylene resin composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-23 — — US disclosed
US-20130161875-A1 MONO-AND MULTI-LAYER BLOWN FILMS BASF SE (DE) 2013-06-27 — — US disclosed
US-20110301268-A1 POLYPROPYLENE RESIN COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-12-08 — — US disclosed
EP-2026965-B1 MONO- AND MULTI-LAYER BLOWN FILMS BASF SE (DE) 2010-09-01 — — EP disclosed
US-20090208718-A1 Mono-and multi-layer blown films CIBA CORP. 2009-08-20 — — US disclosed
US-7479515-B2 Polypropylene resin compositions CIBA SPECIALTY CHEMICALS CORP. (US) 2009-01-20 — — US disclosed
US-20070170398-A1 Polypropylene resin compositions SCHMIDT HANS-WERNER 2007-07-26 — — US disclosed
US-7235191-B2 Crystallizable polypropylene homopolymer, random copolymer, alternating or segmented copolymer, block copolymer or a blend of polypropylene with another synthetic polymer, and b) 0.001 to 5% relative to the weight of component (a), of a specific CIBA SPECIALTY CHEMICALS CORP. (US) 2007-06-26 — — US disclosed
US-20040063830-A1 Crystallizable polypropylene homopolymer, random copolymer, alternating or segmented copolymer, block copolymer or a blend of polypropylene with another synthetic polymer, and b) 0.001 to 5% relative to the weight of component (a), of a specific CIBA SPECIALTY CHEMICALS CORPORATION 2004-04-01 — — US disclosed
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