Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL29239355

N.Oc1ccc(-c2nccs2)cc1

nearest known ligand 0.61

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDPK1 O15530 1/20 0.61
LOXL2 Q9Y4K0 1/20 0.58
ADRB2 P07550 2/20 0.53
ESR1 P03372 1/20 0.49
ESR2 Q92731 1/20 0.49
SYK P43405 1/20 0.49
CYP2A6 P11509 1/20 0.48
SMPD3 Q9NY59 1/20 0.47
FBP1 P09467 1/20 0.46
ABL1 P00519 1/20 0.45
BCR P11274 1/20 0.45
HDAC3 O15379 1/20 0.43
HDAC4 P56524 1/20 0.43
HDAC1 Q13547 1/20 0.43
HDAC7 Q8WUI4 1/20 0.43
HDAC2 Q92769 1/20 0.43
HDAC10 Q969S8 1/20 0.43
HDAC11 Q96DB2 1/20 0.43
HDAC8 Q9BY41 1/20 0.43
HDAC6 Q9UBN7 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL466426 0.98 PDPK1 (0.63) PDPK1LOXL2ADRB2ESR1ESR2
SCHEMBL2295510 0.87 PDPK1 (0.52) PDPK1LOXL2ADRB2ESR1ESR2
SCHEMBL722198 0.87 PDPK1 (0.77) PDPK1LOXL2ADRB2CYP2A6SMPD3
SCHEMBL23328027 0.80 ESR1 (0.50) PDPK1LOXL2ADRB2ESR1ESR2
Ethoxycarbonyl Group SCHEMBL29291640 0.79 ADRB2 (0.47) PDPK1LOXL2ADRB2ESR1ESR2
SCHEMBL17704291 0.78 PDPK1 (0.65) PDPK1LOXL2ADRB2CYP2A6SMPD3
SCHEMBL533419 0.78 LOXL2 (0.67) PDPK1LOXL2ADRB2CYP2A6SMPD3
SCHEMBL16119908 0.77 PDPK1 (0.63) PDPK1LOXL2ADRB2CYP2A6SMPD3
SCHEMBL21791658 0.77 LOXL2 (0.71) PDPK1LOXL2ADRB2CYP2A6SMPD3
SCHEMBL19219079 0.77 PDPK1 (0.63) PDPK1LOXL2ADRB2CYP2A6ABL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118007244-A Texturing additive for preparing monocrystalline silicon with special-shaped rough surface structure and application method thereof 常州时创能源股份有限公司 2024-05-10 CN disclosed