Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.50 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.50 |
| ▸ | LTA4H | P09960 | 6/20 | 0.44 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.44 |
| ▸ | BAX | Q07812 | 1/20 | 0.44 |
| ▸ | KIF11 | P52732 | 1/20 | 0.38 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1719753 | 0.89 | ESR1 (0.54) | ESR1ESR2MEN1KMT2ANR1H2 | |
| SCHEMBL28512548 | 0.87 | ESR1 (0.52) | ESR1ESR2MEN1KMT2AKIF11 | |
| SCHEMBL8355667 | 0.82 | ALDH1A1 (0.52) | MEN1KMT2AKIF11PARP10 | |
| SCHEMBL19328248 | 0.80 | ALDH1A1 (0.49) | KMT2APARP10 | |
| SCHEMBL7647444 | 0.78 | ESR1 (0.35) | ESR1ESR2NR1H2 | |
| SCHEMBL27878898 | 0.77 | ESR1 (0.50) | ESR1ESR2MEN1KMT2AKIF11 | |
| SCHEMBL8999933 | 0.77 | ESR1 (0.75) | ESR1ESR2MEN1KMT2ALTA4H | |
| SCHEMBL8541423 | 0.77 | NR4A1 (0.53) | MEN1KMT2A | |
| SCHEMBL4890621 | 0.77 | POLB (0.51) | MEN1KMT2A | |
| SCHEMBL1765673 | 0.77 | KIF11 (0.64) | ESR1ESR2MEN1KMT2ALTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115044040-B | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern forming method | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-115044040-A | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern formation method | 信越化学工业株式会社 | 2022-09-13 | — | — | CN | disclosed |