(4-Chlorophenyl)(Hydroxy)Methylphosphonic Acid

(4-Chlorophenyl)(Hydroxy)Methylphosphonic Acid

SCHEMBL292744

O=P(O)(O)C(O)c1ccc(Cl)cc1

nearest known ligand 0.61

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PGK1 P00558 5/20 0.59
PGK2 P07205 5/20 0.59
CYP1A2 P05177 1/20 0.52
LMNA P02545 1/20 0.52
MAPT P10636 1/20 0.52
THRB P10828 1/20 0.52
PMP22 Q01453 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
NPSR1 Q6W5P4 1/20 0.52
MMP2 P08253 2/20 0.48
MMP8 P22894 1/20 0.48
MMP14 P50281 1/20 0.48
PTPN5 P54829 2/20 0.47
CA12 O43570 1/20 0.43
CA2 P00918 1/20 0.43
CA9 Q16790 1/20 0.43
CA14 Q9ULX7 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
(4-Chlorophenyl)(Hydroxy)Methylphosphonic Acid SCHEMBL5746553 1.00 PGK1 (0.59) PGK1PGK2CYP1A2LMNAMAPT
SCHEMBL11208020 0.88 PGK1 (0.71) PGK1PGK2PTPN5
SCHEMBL11079769 0.82 PGK1 (0.59) PGK1PGK2NPSR1PTPN5
SCHEMBL10252598 0.79 PGK1 (0.61) PGK1PGK2MMP2PTPN5CA12
SCHEMBL19638012 0.79 ACP3 (0.58) PGK1PGK2CYP1A2LMNAMAPT
SCHEMBL4093802 0.79 SRC (0.60) PGK1PGK2CYP1A2LMNAMAPT
SCHEMBL11078378 0.77 PGK1 (0.59) PGK1PGK2CYP1A2MMP2MMP8
SCHEMBL5743524 0.77 PGK1 (0.59) PGK1PGK2LMNAMMP2MMP8
SCHEMBL11080198 0.77 PGK1 (0.59) PGK1PGK2LMNAMMP2MMP8
SCHEMBL11082211 0.77 PGK1 (0.59) PGK1PGK2MMP2PTPN5CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115385784-A Preparation method of 1- (4-chlorphenyl) -2-cyclopropyl-1-acetone 顺毅股份有限公司 2022-11-25 CN claimed
CN-102089466-B Improved copper-tin electrolyte and method for depositing bronze layers UMICORE GALVANOTECHNIK GMBH 2012-11-07 CN claimed
US-8211286-B2 Electrolyte and method for depositing decorative and technical layers of black ruthenium Umicore Galvotechnik GmbH (DE) 2012-07-03 US claimed
EP-2310558-B1 IMPROVED COPPER-TIN ELECTROLYTE AND PROCESS FOR THE DEPOSITION OF TIN-BRONZE LAYERS UMICORE GALVANOTECHNIK GMBH (DE) 2012-03-14 EP claimed
JP-2011527381-A 2011-10-27 JP claimed
US-20110174631-A1 COPPER-TIN ELECTROLYTE AND PROCESS FOR THE DEPOSITION OF BRONZE LAYERS UMICORE GALVANOTECHNIK GMBH (DE) 2011-07-21 US claimed
CN-102089466-A Improved copper-tin electrolyte and method for depositing bronze layers UMICORE GALVANOTECHNIK GMBH 2011-06-08 CN claimed
CN-101622379-B Copper-tin electrolyte and method for depositing bronze layers UMICORE GALVANOTECHNIK GMBH 2011-05-25 CN claimed
EP-2310558-A1 IMPROVED COPPER-TIN ELECTROLYTE AND PROCESS FOR THE DEPOSITION OF BRONZE LAYERS Umicore Galvanotechnik GmbH (DE) 2011-04-20 EP claimed
CN-101675185-B Electrolyte and method for depositing a decorative technical layer of black ruthenium UMICORE GALVANOTECHNIK GMBH 2011-04-13 CN claimed
CN-101675185-A Electrolyte and method for depositing a decorative technical layer of black ruthenium UMICORE GALVANOTECHNIK GMBH 2010-03-17 CN claimed
US-20100051468-A1 ELECTROLYTE AND METHOD FOR DEPOSITING DECORATIVE AND TECHNICAL LAYERS OF BLACK RUTHENIUM UMICORE GALVANOTECHNIK GMBH (DE) 2010-03-04 US claimed
WO-2010003621-A1 IMPROVED COPPER-TIN ELECTROLYTE AND PROCESS FOR THE DEPOSITION OF BRONZE LAYERS UMICORE GALVANOTECHNIK GMBH (DE) 2010-01-14 WO claimed
CN-101622379-A Copper-tin electrolyte and method for depositing bronze layers UMICORE GALVANOTECHNIK GMBH 2010-01-06 CN claimed
EP-1961840-B1 Copper-tin electrolyte and method for depositing bronze layers UMICORE GALVANOTECHNIK GMBH (DE) 2009-12-30 EP claimed
EP-1975282-B1 Electrolyte and method for electroplating decorative and technical layers of black ruthenium. UMICORE GALVANOTECHNIK GMBH (DE) 2009-11-18 EP claimed
WO-2008116545-A1 ELECTROLYTE AND METHOD FOR DEPOSITING DECORATIVE AND TECHNICAL LAYERS OF BLACK RUTHENIUM UMICORE GALVANOTECHNIK GMBH (DE) 2008-10-02 WO claimed
EP-1975282-A1 Electrolyte and method for separating decorative and technical layers from black ruthenium Umicore Galvanotechnik GmbH (DE) 2008-10-01 EP claimed
EP-1961840-A1 Copper-tin electrolyte and method for depositing bronze layers Umicore Galvanotechnik GmbH (DE) 2008-08-27 EP claimed
WO-2008098666-A1 COPPER-TIN ELECTROLYTE AND METHOD FOR DEPOSITING BRONZE LAYERS UMICORE GALVANOTECHNIK GMBH (DE) 2008-08-21 WO claimed