SCHEMBL29318964

SCHEMBL29318964

CCON(C(=O)OCc1ccccc1)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.50
MAPT P10636 1/20 0.47
HPGD P15428 1/20 0.47
CHRM2 P08172 1/20 0.46
CHRM5 P08912 1/20 0.46
CHRM1 P11229 1/20 0.46
CHRM3 P20309 1/20 0.46
L3MBTL1 Q9Y468 4/20 0.45
TDP1 Q9NUW8 3/20 0.45
MAPK1 P28482 2/20 0.45
KMT2A Q03164 2/20 0.45
SLC6A2 P23975 1/20 0.45
SLC6A3 Q01959 1/20 0.45
LMNA P02545 2/20 0.42
POLB P06746 1/20 0.42
HSD17B10 Q99714 1/20 0.42
CYP3A4 P08684 1/20 0.42
TSHR P16473 1/20 0.42
CCR6 P51684 1/20 0.42
PAX8 Q06710 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27678665 0.88 ALDH1A1 (0.49) ALDH1A1MAPTHPGDL3MBTL1TDP1
SCHEMBL9869947 0.87 ALDH1A1 (0.49) ALDH1A1MAPTHPGDL3MBTL1KMT2A
SCHEMBL3939575 0.79 ALDH1A1 (0.44) ALDH1A1MAPTHPGDL3MBTL1TDP1
SCHEMBL5510643 0.78 ALDH1A1 (0.44) ALDH1A1MAPTHPGDKMT2ALMNA
SCHEMBL28246275 0.78 ALDH1A1 (0.50) ALDH1A1MAPTHPGDL3MBTL1TDP1
SCHEMBL25336401 0.78 ALDH1A1 (0.47) ALDH1A1KMT2ALMNAPOLBTSHR
SCHEMBL5512049 0.78 ALDH1A1 (0.47) ALDH1A1KMT2ALMNAPOLBTSHR
SCHEMBL5509056 0.78 KMT2A (0.54) ALDH1A1HPGDL3MBTL1TDP1KMT2A
SCHEMBL28459939 0.78 ALDH1A1 (0.58) ALDH1A1MAPTHPGDCHRM2CHRM5
SCHEMBL27558112 0.77 CHRNB2 (0.56) ALDH1A1MAPTHPGDCHRM2CHRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4400914-A2 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-17 EP disclosed