SCHEMBL29319736

SCHEMBL29319736

O=C(OCCc1ccccc1)C1=CCCCC=C1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.48
ESR2 Q92731 1/20 0.48
NPC1 O15118 2/20 0.47
RAB9A P51151 2/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
TDP1 Q9NUW8 2/20 0.47
ALDH1A1 P00352 2/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
TP53 P04637 1/20 0.47
GLA P06280 1/20 0.47
CYP3A4 P08684 1/20 0.47
HPGD P15428 1/20 0.47
TSHR P16473 1/20 0.47
MAPK1 P28482 1/20 0.47
HIF1A Q16665 1/20 0.47
HSD17B10 Q99714 1/20 0.47
MMP1 P03956 1/20 0.44
MMP2 P08253 1/20 0.44
MMP9 P14780 1/20 0.44
MMP12 P39900 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10899341 0.77 TDP1 (0.53) NPC1RAB9AL3MBTL1TDP1ALDH1A1
SCHEMBL14218298 0.74 ESR1 (0.50) ESR1ESR2NPC1RAB9AL3MBTL1
Cyclohexane SCHEMBL28344164 0.71 ALDH1A1 (0.58) ESR1ESR2NPC1RAB9AL3MBTL1
Phenethyl Benzoate SCHEMBL168823 0.70 ESR1 (0.80) ESR1ESR2NPC1RAB9AL3MBTL1
SCHEMBL290777 0.70 TSHR (0.77) ESR1ESR2NPC1RAB9AL3MBTL1
SCHEMBL4459400 0.70 ESR1 (0.86) ESR1ESR2NPC1RAB9AL3MBTL1
Phenethyl Benzoate SCHEMBL4351681 0.70 ESR1 (0.80) ESR1ESR2NPC1RAB9AL3MBTL1
SCHEMBL27970941 0.69 HCAR2 (0.42) ESR1ESR2NPC1RAB9AL3MBTL1
SCHEMBL7904183 0.68 ALDH1A1 (0.44) ESR1RAB9AL3MBTL1TDP1ALDH1A1
SCHEMBL4351183 0.68 ALDH1A1 (0.64) ESR1ESR2NPC1RAB9AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4400914-A2 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-17 EP disclosed