SCHEMBL29323712

SCHEMBL29323712

C=C(C)C(=O)OC(C(C)C)S(=O)(=O)c1ccc(F)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 5/20 0.38
MMP13 P45452 5/20 0.38
MMP2 P08253 4/20 0.38
MMP9 P14780 4/20 0.38
MMP3 P08254 2/20 0.38
MMP7 P09237 2/20 0.38
PSEN1 P49768 3/20 0.35
PSEN2 P49810 3/20 0.35
APH1B Q8WW43 3/20 0.35
NCSTN Q92542 3/20 0.35
APH1A Q96BI3 3/20 0.35
PSENEN Q9NZ42 3/20 0.35
POLB P06746 1/20 0.35
CA1 P00915 3/20 0.35
CA2 P00918 3/20 0.35
KMT2A Q03164 2/20 0.35
MMP8 P22894 2/20 0.35
CA4 P22748 1/20 0.35
CA9 Q16790 1/20 0.35
MMP14 P50281 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29323716 0.85 MMP1 (0.37) MMP1MMP13MMP2MMP9MMP3
SCHEMBL29323725 0.76 TSHR (0.46) MMP1MMP13MMP2MMP9MMP3
SCHEMBL29323814 0.74 KMT2A (0.41) POLBKMT2AMEN1LMNAGAA
SCHEMBL25564679 0.72 HTT (0.37) ALDH1A1
SCHEMBL14648174 0.72 IDO1 (0.44)
SCHEMBL27662776 0.71 TSHR (0.39) ALDH1A1
SCHEMBL5872395 0.70 LMNA (0.45) CA1CA2KMT2ACA9LMNA
SCHEMBL8664446 0.68 F2 (0.44) MMP1MMP13MMP2MMP9MMP3
SCHEMBL26861555 0.67 ESR1 (0.41) CA1CA2CA9
SCHEMBL14648171 0.67 NPC1 (0.42) POLBKMT2AMEN1LMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed