SCHEMBL29323779

SCHEMBL29323779

C=Cc1ccc(C(=O)OCCS(C)(=O)=O)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.43
LMNA P02545 4/20 0.43
CYP1A2 P05177 3/20 0.43
CYP2C19 P33261 2/20 0.43
CYP3A4 P08684 2/20 0.43
CYP2C9 P11712 1/20 0.43
PDE4D Q08499 1/20 0.43
ALDH1A1 P00352 3/20 0.42
ESR1 P03372 2/20 0.42
CHRM1 P11229 1/20 0.42
SLC6A2 P23975 1/20 0.42
KDR P35968 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
STS P08842 3/20 0.42
PHLPP2 Q6ZVD8 1/20 0.42
SNCA P37840 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
NPC1 O15118 1/20 0.41
MAPT P10636 1/20 0.41
RAB9A P51151 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12376769 0.88 TDP1 (0.43) TSHRLMNACYP1A2CYP2C19CYP3A4
SCHEMBL26417020 0.85 SNCA (0.49) TSHRLMNACYP1A2CYP2C19CYP3A4
SCHEMBL29323772 0.82 ALDH1A1 (0.43) LMNAALDH1A1TDP1MAPTHPGD
SCHEMBL4904335 0.82 ALDH1A1 (0.64) TSHRLMNACYP1A2CYP2C19CYP3A4
SCHEMBL26417026 0.82 TDP1 (0.58) TSHRLMNACYP1A2CYP2C19CYP3A4
SCHEMBL29323769 0.81 TDP1 (0.44) LMNAALDH1A1ESR1TDP1NPC1
SCHEMBL14407325 0.81 TSHR (0.50) TSHRLMNACYP1A2CYP2C19CYP3A4
SCHEMBL10594109 0.80 SNCA (0.45) TSHRLMNACYP1A2CYP2C19CYP3A4
SCHEMBL14094414 0.80 SERPINE1 (0.47) TSHRLMNACYP1A2CYP2C19CYP3A4
SCHEMBL28809943 0.80 SNCA (0.45) TSHRLMNACYP1A2CYP2C19CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed